SCHEMBL6690565

SCHEMBL6690565

C=C(C)c1ccc(OC(C)(C)OCCCC)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
GAA P10253 2/20 0.36
RAB9A P51151 2/20 0.36
TP53 P04637 2/20 0.36
HDAC3 O15379 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
PLA2G4B P0C869 2/20 0.36
PSEN1 P49768 2/20 0.35
PSEN2 P49810 2/20 0.35
APH1B Q8WW43 2/20 0.35
NCSTN Q92542 2/20 0.35
APH1A Q96BI3 2/20 0.35
PSENEN Q9NZ42 2/20 0.35
LMNA P02545 2/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ESR1 P03372 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6689017 0.97 TP53 (0.41) TSHRGAARAB9ATP53PLA2G4B
SCHEMBL6694140 0.96 TP53 (0.43) TSHRGAARAB9ATP53PLA2G4B
SCHEMBL6689043 0.92 L3MBTL1 (0.34) TSHRGAARAB9ATP53HDAC3
SCHEMBL6697849 0.86 GAA (0.36) TSHRGAARAB9ATP53HDAC3
SCHEMBL6690485 0.85 PPARA (0.34) TSHRHDAC3HDAC1HDAC2L3MBTL1
SCHEMBL6695737 0.85 GAA (0.35) TSHRGAARAB9ATP53HDAC3
SCHEMBL6691454 0.84 ELANE (0.35) TSHRGAARAB9ATP53HDAC3
SCHEMBL6697798 0.84 GAA (0.34) TSHRGAARAB9ATP53HDAC3
SCHEMBL6695241 0.84 TP53 (0.40) TSHRGAARAB9ATP53PLA2G4B
SCHEMBL6699148 0.82 SLC2A1 (0.34) TSHRGAARAB9ATP53HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed