SCHEMBL6689348

SCHEMBL6689348

C=C(C)c1ccc(OC(C)OC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.41
MAPT P10636 3/20 0.40
PARP10 Q53GL7 1/20 0.40
MEN1 O00255 1/20 0.39
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
TAS1R2 Q8TE23 1/20 0.34
POLB P06746 1/20 0.34
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
GAA P10253 1/20 0.34
RAB9A P51151 2/20 0.33
NQO2 P16083 1/20 0.33
HPGD P15428 1/20 0.33
CES2 O00748 1/20 0.33
CES1 P23141 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33
THRB P10828 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6691528 0.85 KMT2A (0.43) KMT2AMAPTPARP10MEN1POLB
SCHEMBL19886220 0.83 KMT2A (0.59) KMT2AMAPTPARP10MEN1POLB
SCHEMBL6697110 0.83 KMT2A (0.38) KMT2AMAPTPARP10MEN1POLB
SCHEMBL6694133 0.83 KMT2A (0.38) KMT2AMAPTPARP10MEN1TAS1R3
SCHEMBL685750 0.82 KMT2A (0.37) KMT2AMAPTPARP10MEN1POLB
SCHEMBL685867 0.80 KMT2A (0.36) KMT2AMAPTPARP10MEN1POLB
SCHEMBL1144747 0.80 PARP10 (0.44) KMT2AMAPTPARP10MEN1POLB
SCHEMBL6691138 0.79 MAPT (0.37) KMT2AMAPTPARP10MEN1POLB
SCHEMBL6689051 0.79 KMT2A (0.35) KMT2AMAPTPARP10TAS1R3TAS1R1
SCHEMBL6694487 0.79 TSHR (0.37) KMT2AMAPTGAARAB9ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6465150-B1 COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER JSR CORPORATION (JP) 2002-10-15 US claimed
US-20180024433-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2018-01-25 US disclosed
US-20180022916-A1 METHOD OF PREPARING POLYMER COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2018-01-25 US disclosed
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6465150-B1 COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER JSR CORPORATION (JP) 2002-10-15 US disclosed
US-6235446-B1 MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER JSR CORPORATION (JP) 2001-05-22 US disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed