SCHEMBL6697110

SCHEMBL6697110

C=C(C)c1ccc(OC(C)OC(C)(C)C)cc1

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.38
PARP10 Q53GL7 1/20 0.37
MAPT P10636 2/20 0.33
MEN1 O00255 1/20 0.33
NR1H4 Q96RI1 1/20 0.33
ELANE P08246 3/20 0.32
POLB P06746 1/20 0.32
HPGD P15428 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6692061 0.86 KMT2A (0.36) KMT2APARP10MAPTMEN1NR1H4
SCHEMBL6689348 0.83 KMT2A (0.41) KMT2APARP10MAPTMEN1ELANE
SCHEMBL6690524 0.83 KMT2A (0.33) KMT2APARP10MAPTELANE
SCHEMBL6694754 0.80 KMT2A (0.31) KMT2APARP10MAPTNR1H4
SCHEMBL6691528 0.80 KMT2A (0.43) KMT2APARP10MAPTMEN1POLB
SCHEMBL19886220 0.79 KMT2A (0.59) KMT2APARP10MAPTMEN1POLB
SCHEMBL6694138 0.78 TAS1R3 (0.33) ELANE
SCHEMBL685750 0.77 KMT2A (0.37) KMT2APARP10MAPTMEN1POLB
SCHEMBL685867 0.76 KMT2A (0.36) KMT2APARP10MAPTMEN1NR1H4
Ethylene SCHEMBL28795731 0.76 KDM4E (0.40) KMT2AMEN1POLBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6281318-B1 REACTING 4-(1-METHYLETHENYL-)PHENYL WITH VINYL ETHER MITSUI CHEMICALS, INC. (JP) 2001-08-28 US disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed