SCHEMBL6699148

SCHEMBL6699148

C=C(C)c1ccc(OC(C)(OCCCC)C(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 1/20 0.34
TSHR P16473 2/20 0.33
HDAC3 O15379 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
GAA P10253 1/20 0.33
RAB9A P51151 1/20 0.33
TP53 P04637 1/20 0.33
PSEN1 P49768 2/20 0.33
PSEN2 P49810 2/20 0.33
APH1B Q8WW43 2/20 0.33
NCSTN Q92542 2/20 0.33
APH1A Q96BI3 2/20 0.33
PSENEN Q9NZ42 2/20 0.33
PLA2G4B P0C869 2/20 0.33
HRH2 P25021 1/20 0.32
HRH1 P35367 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6692465 0.97 TP53 (0.38) TSHRGAARAB9ATP53PSEN1
SCHEMBL6691474 0.96 TP53 (0.40) TSHRGAARAB9ATP53PSEN1
SCHEMBL6694517 0.93 TAS1R3 (0.32)
SCHEMBL6694144 0.87 ABCB11 (0.31) TSHR
SCHEMBL6690565 0.82 TSHR (0.36) TSHRHDAC3HDAC1HDAC2GAA
SCHEMBL6697849 0.81 GAA (0.36) SLC2A1TSHRHDAC3HDAC1HDAC2
SCHEMBL6689017 0.80 TP53 (0.41) SLC2A1TSHRGAARAB9ATP53
SCHEMBL6695737 0.80 GAA (0.35) SLC2A1TSHRHDAC3HDAC1HDAC2
SCHEMBL6697194 0.79 MAPT (0.35) TSHR
SCHEMBL6697798 0.79 GAA (0.34) SLC2A1TSHRHDAC3HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed