SCHEMBL6691334

SCHEMBL6691334

C=C(C)c1ccc(OC(OCCC)C(C)(C)C)cc1

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PLK1 P53350 1/20 0.32
KDM4E B2RXH2 1/20 0.32
HTT P42858 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
PPARG P37231 2/20 0.31
PPARA Q07869 2/20 0.31
ELANE P08246 1/20 0.31
LTB4R Q15722 1/20 0.30
LTB4R2 Q9NPC1 1/20 0.30
SLC2A1 P11166 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6689710 0.94 SLC2A1 (0.35) PPARGPPARASLC2A1
SCHEMBL6695729 0.92 TP53 (0.39) PPARGPPARA
SCHEMBL6695326 0.90 TP53 (0.41) PPARGPPARASLC2A1
SCHEMBL6694160 0.88 KMT2A (0.31) PPARGPPARA
SCHEMBL6689731 0.81 L3MBTL1 (0.36) L3MBTL1PLK1KDM4EHTTSMN1; SMN2
SCHEMBL6689051 0.80 KMT2A (0.35) L3MBTL1PLK1KDM4EHTTSMN1; SMN2
SCHEMBL6697835 0.80 MAPT (0.36)
SCHEMBL6692471 0.79 L3MBTL1 (0.33) L3MBTL1PLK1KDM4EHTTSMN1; SMN2
SCHEMBL6690524 0.78 KMT2A (0.33) ELANE
SCHEMBL6694156 0.78 TAS1R3 (0.33) L3MBTL1PLK1KDM4EHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed