SCHEMBL669208

SCHEMBL669208

C=Cc1ccc(-c2c3ccccc3cc3ccccc23)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.50
ALDH1A1 P00352 4/20 0.43
TSHR P16473 1/20 0.43
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
ESR1 P03372 3/20 0.37
ESR2 Q92731 3/20 0.37
NQO2 P16083 1/20 0.37
NISCH Q9Y2I1 1/20 0.36
CES1 P23141 1/20 0.36
HSD17B10 Q99714 2/20 0.35
HIF1A Q16665 1/20 0.35
CYP1B1 Q16678 1/20 0.35
HTR2A P28223 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35
CYP1A2 P05177 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4956947 0.86 ALDH1A1 (0.52) ALOX5ALDH1A1TSHRMEN1KMT2A
SCHEMBL9955735 0.84 MEN1 (0.39) ALOX5ALDH1A1TSHRMEN1KMT2A
SCHEMBL6563914 0.82 ALDH1A1 (0.54) ALDH1A1TSHRMEN1KMT2AESR1
SCHEMBL3158332 0.81 ALOX5 (0.47) ALOX5ALDH1A1TSHRMEN1KMT2A
SCHEMBL30800593 0.81 ALOX5 (0.50) ALOX5ALDH1A1MEN1KMT2AESR1
SCHEMBL4821274 0.81 ALOX5 (0.50) ALOX5ALDH1A1MEN1KMT2AESR1
SCHEMBL27898382 0.81 ALOX5 (0.50) ALOX5ALDH1A1MEN1KMT2AESR1
SCHEMBL5880703 0.80 ALDH1A1 (0.52) ALDH1A1TSHRESR1ESR2HSD17B10
SCHEMBL5880709 0.80 ALDH1A1 (0.52) ALDH1A1TSHRMEN1KMT2AESR1
SCHEMBL11577136 0.79 ESR1 (0.51) ALDH1A1TSHRKMT2AESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1311612-B1 REACTOR ALLOY OF SYNDIOTACTIC POLYSTYRENE HAVING HIGH IMPACT RESISTANCE SAMSUNG ATOFINA CO LTD (KR) 2007-02-28 EP claimed
CN-1249153-C Polystyrene reactor alloy with high impact resistance SAMSUNG GENERAL CHEMICALS CO (KR) 2006-04-05 CN claimed
EP-1311612-A4 REACTOR ALLOY OF SYNDIOTACTIC POLYSTYRENE HAVING HIGH IMPACT RESISTANCE SAMSUNG ATOFINA CO LTD (KR) 2005-04-06 EP claimed
US-6780938-B2 IN COMPARISON WITH A MELT BLEND WITHOUT IMPAIRING HEAT RESISTANCE AND ELASTIC MODULUS BY INTRODUCING RUBBERY ELASTOMER AND POLYPHENYLENE ETHER SAMSUNG ATOFINA CO. LTD. (KR) 2004-08-24 US claimed
CN-1454235-A Reactor alloy of syndiotactic polystyrene having high impact resistance SAMSUNG GENERAL CHEMICALS CO (KR) 2003-11-05 CN claimed
US-20030176581-A1 Reactor alloy of syndiotactic polystyrene having high impact resistance SAMSUNG ATOFINA GMBH & CO. LTD. (KR) 2003-09-18 US claimed
EP-1311612-A1 REACTOR ALLOY OF SYNDIOTACTIC POLYSTYRENE HAVING HIGH IMPACT RESISTANCE Samsung General Chemicals Co., Ltd. (KR) 2003-05-21 EP claimed
WO-2002014425-A1 REACTOR ALLOY OF SYNDIOTACTIC POLYSTYRENE HAVING HIGH IMPACT RESISTANCE SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2002-02-21 WO claimed
US-4352876-A CHARGE GENERATION AND CHARGE TRANSPORT LAYERS HITACHI, LTD. (JP) 1982-10-05 US claimed
US-4125701-A ACRYLATE - VINYL ANTHRACENE, ACRIDINE OR CARBAZOLE COPOLYMER HITACHI, LTD. (JP) 1978-11-14 US claimed
JP-56114952-A None JP disclosed
JP-59201051-A None JP disclosed
JP-7333568-A None JP disclosed
JP-57167031-A None JP disclosed
JP-52152447-A None JP disclosed
JP-S56114952-A COMPOSITE TYPE ELECTROPHOTOGRAPHIC PLATE HITACHI LTD 1981-09-09 JP disclosed
JP-S5418859-A ORGANIC PHOTOCONDUCTIVE COMPOSITION TORAY IND INC 1979-02-13 JP disclosed
US-4125701-A ACRYLATE - VINYL ANTHRACENE, ACRIDINE OR CARBAZOLE COPOLYMER HITACHI, LTD. (JP) 1978-11-14 US disclosed
JP-S52152447-A ORGANIC PHOTOCONDUCTIVE MATERIAL COMPOSITIONS TORAY IND INC 1977-12-17 JP disclosed
US-3764590-A ORGANIC PHOTOCONDUCTIVE MATERIALS HITACHI LTD 1973-10-09 US disclosed