SCHEMBL6693145

SCHEMBL6693145

C=C(C)c1ccc(OC(C)(C)OC2CCCCC2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 5/20 0.35
HTT P42858 2/20 0.35
LMNA P02545 2/20 0.35
MAPT P10636 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
NPC1 O15118 4/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CHRM2 P08172 4/20 0.33
CHRM1 P11229 4/20 0.33
STS P08842 3/20 0.33
ALDH1A1 P00352 1/20 0.33
MDM2 Q00987 1/20 0.33
PARP10 Q53GL7 1/20 0.33
CHRM4 P08173 3/20 0.32
CHRM3 P20309 3/20 0.32
CASP3 P42574 1/20 0.32
SENP8 Q96LD8 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694195 0.98 MAPT (0.33) RAB9AHTTLMNAMAPTMEN1
SCHEMBL6689866 0.84 PARP10 (0.32) RAB9AHTTLMNAMAPTNPC1
SCHEMBL6690526 0.83 SMN1; SMN2 (0.33) RAB9AHTTLMNAMAPTMEN1
SCHEMBL6691373 0.83 PPARG (0.35) RAB9AHTTLMNAMAPTMEN1
SCHEMBL6694137 0.82 SMN1; SMN2 (0.32) RAB9AHTTLMNAMAPTNPC1
SCHEMBL6689336 0.82 PPARG (0.34) RAB9AHTTLMNAMAPTMEN1
SCHEMBL6693168 0.81 ALDH1A1 (0.32) RAB9AHTTMAPTMEN1KMT2A
SCHEMBL6694130 0.80 ELANE (0.33) RAB9AMAPTMEN1KMT2ANPC1
SCHEMBL8074129 0.79 ALDH1A1 (0.34) RAB9AHTTMAPTMEN1KMT2A
SCHEMBL6692530 0.78 ALDH1A1 (0.33) RAB9AHTTMEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed