SCHEMBL6691373

SCHEMBL6691373

C=C(C)c1ccc(OC(C)(CC)OC2CCCCC2)cc1

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.35
PPARA Q07869 2/20 0.35
ADORA3 P0DMS8 1/20 0.34
RAB9A P51151 4/20 0.33
NPC1 O15118 3/20 0.33
MAPT P10636 3/20 0.33
ALDH1A1 P00352 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
HTT P42858 2/20 0.32
MMP13 P45452 1/20 0.32
STS P08842 3/20 0.31
MDM2 Q00987 1/20 0.30
LMNA P02545 2/20 0.30
PARP15 Q460N3 1/20 0.30
PARP10 Q53GL7 1/20 0.30
KDM2B Q8NHM5 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6689336 0.99 PPARG (0.34) PPARGPPARAADORA3RAB9ANPC1
SCHEMBL6693168 0.90 ALDH1A1 (0.32) PPARGPPARAADORA3RAB9ANPC1
SCHEMBL6694130 0.88 ELANE (0.33) RAB9ANPC1MAPTALDH1A1MEN1
SCHEMBL8074129 0.88 ALDH1A1 (0.34) ADORA3RAB9ANPC1MAPTALDH1A1
SCHEMBL6692530 0.86 ALDH1A1 (0.33) RAB9AALDH1A1MEN1KMT2AHPGD
SCHEMBL6693145 0.83 RAB9A (0.35) RAB9ANPC1MAPTALDH1A1MEN1
SCHEMBL6694195 0.82 MAPT (0.33) RAB9ANPC1MAPTMEN1KMT2A
SCHEMBL6699720 0.80 CHRNB2 (0.35) PPARGPPARAADORA3MAPTHPGD
SCHEMBL6689866 0.80 PARP10 (0.32) RAB9ANPC1MAPTSMN1; SMN2HTT
SCHEMBL6690526 0.79 SMN1; SMN2 (0.33) RAB9ANPC1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed