SCHEMBL6694130

SCHEMBL6694130

C=C(C)c1ccc(OC(C)(CCC)OC2CCCC2)cc1

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.33
KDM2B Q8NHM5 1/20 0.32
MEN1 O00255 1/20 0.30
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30
HPGD P15428 1/20 0.30
RAB9A P51151 1/20 0.30
KMT2A Q03164 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6693168 0.99 ALDH1A1 (0.32) ELANEKDM2BMEN1NPC1ALDH1A1
SCHEMBL6692530 0.93 ALDH1A1 (0.33) KDM2BMEN1ALDH1A1HPGDRAB9A
SCHEMBL8074129 0.91 ALDH1A1 (0.34) KDM2BMEN1NPC1ALDH1A1MAPT
SCHEMBL6689336 0.90 PPARG (0.34) KDM2BMEN1NPC1ALDH1A1MAPT
SCHEMBL6691373 0.88 PPARG (0.35) KDM2BMEN1NPC1ALDH1A1MAPT
SCHEMBL6694195 0.81 MAPT (0.33) MEN1NPC1MAPTRAB9AKMT2A
SCHEMBL6690480 0.81 CHRNB2 (0.34) CYP1A2CYP2D6CYP2C19
SCHEMBL6693145 0.80 RAB9A (0.35) MEN1NPC1ALDH1A1MAPTRAB9A
SCHEMBL6694514 0.80 CHRNB2 (0.33) MAPTCYP1A2CYP2D6CYP2C19
SCHEMBL6691383 0.79 ELANE (0.38) ELANEALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed