SCHEMBL6689336

SCHEMBL6689336

C=C(C)c1ccc(OC(C)(CC)OC2CCCC2)cc1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.34
PPARA Q07869 2/20 0.34
ADORA3 P0DMS8 1/20 0.33
MAPT P10636 2/20 0.32
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
MEN1 O00255 2/20 0.32
ALDH1A1 P00352 2/20 0.32
KMT2A Q03164 2/20 0.32
HPGD P15428 1/20 0.32
KDM2B Q8NHM5 1/20 0.31
LMNA P02545 1/20 0.31
PARP10 Q53GL7 1/20 0.31
HTT P42858 2/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
KDM4E B2RXH2 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6691373 0.99 PPARG (0.35) PPARGPPARAADORA3MAPTNPC1
SCHEMBL6694130 0.90 ELANE (0.33) MAPTNPC1RAB9AMEN1ALDH1A1
SCHEMBL6693168 0.88 ALDH1A1 (0.32) PPARGPPARAADORA3MAPTNPC1
SCHEMBL6692530 0.87 ALDH1A1 (0.33) RAB9AMEN1ALDH1A1KMT2AHPGD
SCHEMBL8074129 0.86 ALDH1A1 (0.34) ADORA3MAPTNPC1RAB9AMEN1
SCHEMBL6694195 0.83 MAPT (0.33) MAPTNPC1RAB9AMEN1KMT2A
SCHEMBL6693145 0.82 RAB9A (0.35) MAPTNPC1RAB9AMEN1ALDH1A1
SCHEMBL6689866 0.81 PARP10 (0.32) MAPTNPC1RAB9ALMNAPARP10
SCHEMBL6698245 0.80 CHRNB2 (0.35) PPARGPPARAMAPTALDH1A1
SCHEMBL6699720 0.78 CHRNB2 (0.35) PPARGPPARAADORA3MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed