SCHEMBL6693598

SCHEMBL6693598

C=C(C)c1ccc(OC(C)(CCC)OC(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.35
MEN1 O00255 1/20 0.32
USP2 O75604 1/20 0.32
ABCB11 O95342 1/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
ADORA3 P0DMS8 1/20 0.32
MAPT P10636 1/20 0.32
CYP2C9 P11712 1/20 0.32
ADRB3 P13945 1/20 0.32
HPGD P15428 1/20 0.32
TSHR P16473 1/20 0.32
CNR1 P21554 1/20 0.32
ACHE P22303 1/20 0.32
SLC6A2 P23975 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
MAPK1 P28482 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6693600 0.92 HDAC3 (0.33) ELANEMEN1USP2ABCB11LMNA
SCHEMBL6691069 0.88 ADORA3 (0.33) MEN1USP2ABCB11LMNACYP1A2
SCHEMBL6691383 0.84 ELANE (0.38) ELANEMAPT
SCHEMBL6692034 0.82 ELANE (0.37) ELANEABCB11CYP1A2CYP3A4TSHR
SCHEMBL6689382 0.82 ELANE (0.37) ELANE
SCHEMBL6692063 0.81 ELANE (0.36) ELANEPPARGPPARA
SCHEMBL6691454 0.80 ELANE (0.35) ELANELMNAMAPTTSHR
SCHEMBL5367199 0.79 ELANE (0.41) ELANEABCB11CYP1A2CYP3A4ADORA3
SCHEMBL6695701 0.79 KMT2A (0.36) MEN1USP2ABCB11LMNACYP1A2
SCHEMBL6694170 0.78 CHRNB2 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed