SCHEMBL6702142

SCHEMBL6702142

CC(=O)O[Si](CCN)(OC(C)=O)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
MTNR1A P48039 6/20 0.37
MTNR1B P49286 6/20 0.37
MAPT P10636 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
KIF11 P52732 3/20 0.34
HPGD P15428 2/20 0.33
NPSR1 Q6W5P4 1/20 0.33
ELANE P08246 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ESR1 P03372 1/20 0.33
ITGB3 P05106 1/20 0.33
ITGA2B P08514 1/20 0.33
HMGB1 P09429 1/20 0.33
TSHR P16473 1/20 0.33
GGT1 P19440 1/20 0.33
PTGS1 P23219 1/20 0.33
PTGS2 P35354 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15643396 0.90 L3MBTL1 (0.37) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL712780 0.89 ALDH1A1 (0.42) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL706255 0.86 L3MBTL1 (0.41) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL27618710 0.86 ALDH1A1 (0.40) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL701685 0.86 L3MBTL1 (0.41) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL705416 0.84 ALDH1A1 (0.39) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL708008 0.82 ALDH1A1 (0.42) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL706197 0.81 PTGS2 (0.39) ALDH1A1L3MBTL1CES2CES1TSHR
SCHEMBL704102 0.80 ALDH1A1 (0.41) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1
SCHEMBL27775052 0.80 ALDH1A1 (0.41) ALDH1A1MTNR1AMTNR1BMAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040197484-A1 Coating liquid for forming insulating film and method for producing insulating film SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-07 US disclosed