SCHEMBL6702610

SCHEMBL6702610

CO[Si](OC)(OC)c1c(N)ccc2ccccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.42
TSHR P16473 3/20 0.42
HSD17B10 Q99714 3/20 0.42
CYP3A4 P08684 2/20 0.42
HPGD P15428 1/20 0.42
KEAP1 Q14145 1/20 0.42
HPRT1 P00492 2/20 0.40
IDO1 P14902 1/20 0.40
MAPT P10636 1/20 0.40
CYP2A6 P11509 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
EP300 Q09472 1/20 0.39
KAT8 Q9H7Z6 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
NCF1 P14598 2/20 0.37
POLB P06746 1/20 0.37
F12 P00748 1/20 0.37
PLAU P00749 1/20 0.37
NOS3 P29474 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6697302 0.81 ALDH1A1 (0.38) ALDH1A1TSHRHSD17B10CYP3A4HPGD
SCHEMBL28351386 0.79 CYP2A6 (0.50) ALDH1A1TSHRHSD17B10CYP3A4HPGD
SCHEMBL1638787 0.79 MAPT (0.41) ALDH1A1TSHRHSD17B10CYP3A4HPGD
SCHEMBL1974164 0.78 MAPT (0.58) ALDH1A1HPGDIDO1MAPTMEN1
SCHEMBL2346357 0.76 POLB (0.42) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL29417586 0.76 POLB (0.42) ALDH1A1HSD17B10CYP3A4HPGDMAPT
SCHEMBL28597873 0.75 MAPT (0.38) ALDH1A1TSHRHSD17B10HPGDHPRT1
SCHEMBL358051 0.75 ALDH1A1 (0.50) ALDH1A1TSHRHSD17B10CYP3A4HPGD
SCHEMBL1969874 0.73 ALOX5 (0.46) ALDH1A1TSHRHSD17B10HPGDMAPT
SCHEMBL3355463 0.73 KDM4E (0.50) ALDH1A1IDO1MAPTEP300KAT8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040197484-A1 Coating liquid for forming insulating film and method for producing insulating film SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-07 US disclosed