SCHEMBL6697302

SCHEMBL6697302

CCO[Si](OCC)(OCC)c1c(N)ccc2ccccc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
TSHR P16473 2/20 0.38
HSD17B10 Q99714 2/20 0.38
HPGD P15428 2/20 0.38
CYP3A4 P08684 1/20 0.38
KEAP1 Q14145 1/20 0.38
KMT2A Q03164 3/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
HPRT1 P00492 2/20 0.37
CYP2A6 P11509 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TLR8 Q9NR97 2/20 0.35
KDM4E B2RXH2 2/20 0.35
MAPK1 P28482 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
F12 P00748 1/20 0.34
PLAU P00749 1/20 0.34
NCF1 P14598 1/20 0.34
NOS3 P29474 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1639321 0.81 ALDH1A1 (0.37) ALDH1A1TSHRHSD17B10HPGDKMT2A
SCHEMBL6702610 0.81 ALDH1A1 (0.42) ALDH1A1TSHRHSD17B10HPGDCYP3A4
SCHEMBL4099237 0.79 NR1I2 (0.40) ALDH1A1HSD17B10HPGDCYP3A4KMT2A
SCHEMBL1973024 0.79 MAPT (0.51) HPGDKMT2AKDM4EMAPTMEN1
SCHEMBL1970849 0.79 ALOX5 (0.46) ALDH1A1TSHRHSD17B10HPGDRAB9A
SCHEMBL28597869 0.78 KDM4E (0.33) ALDH1A1TSHRHSD17B10HPGDKMT2A
SCHEMBL3350607 0.76 GABRP (0.36) ALDH1A1HPGDKMT2ARAB9AKDM4E
SCHEMBL29181479 0.74 ALOX5 (0.42) ALDH1A1TSHRHSD17B10HPGDRAB9A
SCHEMBL6748665 0.73 NR1I2 (0.36) ALDH1A1HSD17B10HPGDKMT2ARAB9A
SCHEMBL1639907 0.73 NR1I2 (0.33) ALDH1A1HSD17B10HPGDKMT2ACYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040197484-A1 Coating liquid for forming insulating film and method for producing insulating film SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-07 US disclosed