SCHEMBL6706563

SCHEMBL6706563

O=S(=O)(ONc1cccc2ccccc12)C(F)(F)F

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.49
KEAP1 Q14145 1/20 0.47
KDM4E B2RXH2 7/20 0.43
KMT2A Q03164 4/20 0.43
ALDH1A1 P00352 4/20 0.43
HPGD P15428 4/20 0.43
MEN1 O00255 3/20 0.43
CYP3A4 P08684 2/20 0.43
HSD17B10 Q99714 2/20 0.43
MAPT P10636 2/20 0.43
TP53 P04637 1/20 0.43
ALOX15 P16050 1/20 0.43
TSHR P16473 1/20 0.43
CDC25B P30305 1/20 0.43
ATM Q13315 1/20 0.43
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8913273 0.78 KEAP1 (0.51) RECQLKEAP1KDM4EKMT2AALDH1A1
SCHEMBL28753722 0.75 KEAP1 (0.49) RECQLKEAP1KDM4EKMT2AALDH1A1
SCHEMBL2127567 0.75 KEAP1 (0.61) RECQLKEAP1KDM4EKMT2AALDH1A1
SCHEMBL8854036 0.73 CA2 (0.39) KEAP1KMT2AALDH1A1MEN1HSD17B10
SCHEMBL2449148 0.73 HDAC8 (0.51) KDM4EKMT2AALDH1A1HPGDMEN1
Trifluoromethanesulfonic Acid SCHEMBL28625758 0.72 HDAC1 (0.51) RECQLKEAP1KDM4EKMT2AALDH1A1
SCHEMBL19042419 0.72 KEAP1 (0.57) RECQLKEAP1KDM4EKMT2AALDH1A1
SCHEMBL1056365 0.71 ALDH1A1 (0.46) KDM4EKMT2AALDH1A1HPGDMEN1
SCHEMBL29937164 0.71 ALDH1A1 (0.46) KDM4EKMT2AALDH1A1HPGDMEN1
SCHEMBL11787378 0.71 HTR6 (0.51) RECQLKEAP1KDM4EKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113391518-A Photoresist composition 住友化学株式会社 2021-09-14 CN disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed