SCHEMBL6721039

SCHEMBL6721039

CCOC(=O)C(C)(C)SC(=S)c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.46
RAB9A P51151 3/20 0.46
HPGD P15428 1/20 0.46
CRHBP P24387 1/20 0.46
CRHR2 Q13324 1/20 0.46
SMN1; SMN2 Q16637 3/20 0.42
PARP10 Q53GL7 1/20 0.41
ALDH1A1 P00352 2/20 0.41
HTT P42858 1/20 0.41
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.41
THRB P10828 1/20 0.41
SRD5A2 P31213 2/20 0.40
POLB P06746 2/20 0.40
NPSR1 Q6W5P4 1/20 0.40
PPARA Q07869 2/20 0.40
PPARG P37231 1/20 0.40
MAPK14 Q16539 1/20 0.40
HDAC3 O15379 1/20 0.40
ERCC5 P28715 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL164403 0.89 POLB (0.49) NPC1RAB9AHPGDSMN1; SMN2ALDH1A1
SCHEMBL18113104 0.81 CYP3A4 (0.51) RAB9AHPGDSMN1; SMN2ALDH1A1HTT
SCHEMBL18113306 0.79 PLK1 (0.41) NPC1RAB9AALDH1A1MAPTTHRB
SCHEMBL24244382 0.79 LMNA (0.51) NPC1RAB9AHPGDSMN1; SMN2ALDH1A1
SCHEMBL18113210 0.78 PIN1 (0.45) NPC1RAB9AHPGDCRHBPCRHR2
SCHEMBL6721100 0.77 PARP10 (0.44) NPC1RAB9AHPGDSMN1; SMN2PARP10
SCHEMBL822578 0.76 GAA (0.38) NPC1RAB9AALDH1A1LMNAPOLB
SCHEMBL4298143 0.75 POLB (0.51) NPC1RAB9ASMN1; SMN2ALDH1A1LMNA
SCHEMBL16128970 0.74 NPC1 (0.42) NPC1HPGDALDH1A1POLBNPSR1
SCHEMBL6377517 0.74 NPC1 (0.54) NPC1RAB9AHPGDCRHBPCRHR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
EP-1975712-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed