SCHEMBL6721100

SCHEMBL6721100

CC(C)(C)SC(=S)c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.44
SRD5A2 P31213 3/20 0.43
LTA4H P09960 5/20 0.42
NR1H2 P55055 1/20 0.42
BAX Q07812 1/20 0.42
ALDH1A1 P00352 4/20 0.41
MEN1 O00255 2/20 0.41
HTT P42858 2/20 0.41
KMT2A Q03164 2/20 0.41
MAPT P10636 1/20 0.41
TSHR P16473 1/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
LMNA P02545 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
POLB P06746 1/20 0.40
HSP90AA1 P07900 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HPGD P15428 1/20 0.40
ALOX12 P18054 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL236901 0.83 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AMAPTTSHR
SCHEMBL6721095 0.81 MAPT (0.53) PARP10ALDH1A1MEN1KMT2AMAPT
SCHEMBL16300516 0.80 ALDH1A1 (0.49) PARP10SRD5A2LTA4HNR1H2BAX
SCHEMBL23743522 0.80 CES2 (0.45) PARP10ALDH1A1HTTMAPTTSHR
SCHEMBL6721066 0.80 SMN1; SMN2 (0.44) ALDH1A1MEN1HTTKMT2AMAPT
SCHEMBL6721039 0.77 NPC1 (0.46) PARP10SRD5A2LTA4HALDH1A1HTT
SCHEMBL6721098 0.77 ALDH1A1 (0.50) SRD5A2ALDH1A1MEN1KMT2AMAPT
SCHEMBL6721059 0.74 CES2 (0.46) ALDH1A1MEN1KMT2AMAPTTSHR
SCHEMBL28949676 0.73 LTA4H (0.57) PARP10SRD5A2LTA4HNR1H2BAX
SCHEMBL13810455 0.71 L3MBTL1 (0.40) ALDH1A1MEN1HTTKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed