SCHEMBL6721103

SCHEMBL6721103

CC(C)(C)Cc1ccc(C(=O)Oc2ccccc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 6/20 0.55
▸ TDP1 Q9NUW8 1/20 0.55
▸ L3MBTL1 Q9Y468 1/20 0.55
▸ SMN1; SMN2 Q16637 1/20 0.50
▸ PARP10 Q53GL7 1/20 0.50
▸ TMPRSS15 P98073 2/20 0.49
▸ PRSS1 P07477 1/20 0.49
▸ ACR P10323 1/20 0.49
▸ THRA P10827 1/20 0.49
▸ THRB P10828 1/20 0.49
▸ ALDH1A1 P00352 5/20 0.47
▸ KMT2A Q03164 3/20 0.47
▸ PKM P14618 1/20 0.47
▸ TSHR P16473 1/20 0.47
▸ NSD2 O96028 1/20 0.46
▸ GAA P10253 1/20 0.46
▸ MEN1 O00255 2/20 0.45
▸ HPGD P15428 1/20 0.45
▸ ELANE P08246 1/20 0.44
▸ RAB9A P51151 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17236361 0.94 MAPT (0.64) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL25237891 0.83 THRA (0.51) MAPTTDP1L3MBTL1SMN1; SMN2THRA
SCHEMBL5706102 0.83 RAB9A (0.57) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL20706308 0.83 MAPT (0.62) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL20008697 0.82 PRSS1 (0.52) PARP10TMPRSS15PRSS1ACR
SCHEMBL18720209 0.82 PRSS1 (0.52) PARP10TMPRSS15PRSS1ACR
SCHEMBL70034 0.80 PARP10 (0.70) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL26038913 0.80 PARP10 (0.56) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL5081701 0.80 PARP10 (0.56) MAPTTDP1L3MBTL1SMN1; SMN2PARP10
SCHEMBL3771392 0.79 KMT2A (0.56) MAPTTDP1L3MBTL1SMN1; SMN2PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 — — US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 — — US disclosed
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