Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2327259 | 0.82 | DGAT1 (0.42) | DGAT1CA1CA2ALDH1A1POLB | |
| SCHEMBL8211544 | 0.82 | DGAT1 (0.33) | DGAT1 | |
| SCHEMBL7689028 | 0.81 | DGAT1 (0.31) | DGAT1MMP8 | |
| SCHEMBL9752808 | 0.78 | DGAT1 (0.39) | DGAT1CA1CA2ALDH1A1POLB | |
| SCHEMBL4791578 | 0.76 | DGAT1 (0.38) | DGAT1ALDH1A1POLBMMP8 | |
| SCHEMBL556529 | 0.76 | DGAT1 (0.38) | DGAT1ALDH1A1POLBMMP8 | |
| SCHEMBL10017775 | 0.76 | RIPK1 (0.35) | ALDH1A1 | |
| SCHEMBL3169320 | 0.74 | DGAT1 (0.37) | DGAT1ALDH1A1POLBMMP8 | |
| SCHEMBL17896932 | 0.72 | DGAT1 (0.35) | DGAT1ALDH1A1POLBMMP8 | |
| Hydrochloric Acid SCHEMBL29244022 | 0.71 | DGAT1 (0.48) | DGAT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080081292-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080050675-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |