SCHEMBL6733413

SCHEMBL6733413

Nc1cc(S(=O)(=O)c2ccccc2)c(C(=O)O)c(C(=O)O)c1N

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 4/20 0.51
ALDH1A1 P00352 5/20 0.51
KDM4E B2RXH2 4/20 0.47
HPGD P15428 3/20 0.47
GAA P10253 2/20 0.47
PKM P14618 1/20 0.47
NPSR1 Q6W5P4 1/20 0.44
POLB P06746 1/20 0.42
GFER P55789 1/20 0.42
CDC25B P30305 1/20 0.40
NPY1R P25929 1/20 0.39
LMNA P02545 1/20 0.38
TSHR P16473 1/20 0.37
HTT P42858 1/20 0.37
HKDC1 Q2TB90 1/20 0.37
MEN1 O00255 1/20 0.37
CYP1A2 P05177 1/20 0.37
GLA P06280 1/20 0.37
CYP2C19 P33261 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL459805 0.78 HTR6 (0.60) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL689428 0.77 NPSR1 (0.46) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL4464881 0.77 HTR6 (0.55) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL17774701 0.77 HTR6 (0.69) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL11035205 0.73 HTR6 (0.50) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL4923819 0.71 NPSR1 (0.47) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL10589344 0.70 HTR6 (0.55) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL14990636 0.69 PDE4A (0.45) ALDH1A1KDM4EHPGDGAAPKM
SCHEMBL30751995 0.69 HTR6 (1.00) HTR6ALDH1A1KDM4EHPGDGAA
SCHEMBL395274 0.69 HTR6 (1.00) HTR6ALDH1A1KDM4EHPGDGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6686106-B2 POLYIMIDESILOXANE COPOLYMERS UBE INDUSTRIES, LTD. (JP) 2004-02-03 US disclosed
US-20020001763-A1 Photosensitive resin compositions, insulating films, and processes for formation of the films UBE INDUSTRIES, LTD. 2002-01-03 US disclosed