Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.44 |
| ▸ | RAB9A | P51151 | 5/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | SHBG | P04278 | 1/20 | 0.37 |
| ▸ | IDH1 | O75874 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 3/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29371482 | 1.00 | NPC1 (0.44) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL11907376 | 0.94 | NPC1 (0.41) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL22369627 | 0.94 | NPC1 (0.43) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL3072177 | 0.91 | NPC1 (0.39) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL76991 | 0.90 | NPC1 (0.40) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL29353178 | 0.90 | NPC1 (0.40) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL77379 | 0.90 | NPC1 (0.40) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL29356319 | 0.90 | NPC1 (0.40) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL7570384 | 0.88 | NPC1 (0.45) | NPC1RAB9ALMNAPOLBSHBG | |
| SCHEMBL18375140 | 0.88 | NPC1 (0.45) | NPC1RAB9ALMNAPOLBSHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 242 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1972323-A2 | Hair colorant | Henkel AG & Co. KGaA (DE) | 2008-09-24 | — | — | EP | claimed |
| EP-0309402-B2 | N-substituted hindered amine stabilizers | CIBA SC HOLDING AG (CH) | 2002-06-12 | — | — | EP | claimed |
| EP-0309401-B2 | Stabilization of coatings with N-hydroxy hindered amines | CIBA SC HOLDING AG (CH) | 2002-06-05 | — | — | EP | claimed |
| US-6365139-B2 | Cosmetic stick | AVON PRODUCTS, INC. | 2002-04-02 | — | — | US | claimed |
| EP-0309402-B1 | N-substituted hindered amine stabilizers | CIBA GEIGY AG (CH) | 1995-01-11 | — | — | EP | claimed |
| EP-0309401-B1 | Stabilization of coatings with N-hydroxy hindered amines | CIBA GEIGY AG (CH) | 1994-10-26 | — | — | EP | claimed |
| US-5124378-A | Resin containign N-Hydroxyl hindered amine oxidative and light stabilizers | CIBA-GEIGY CORPORATION (US) | 1992-06-23 | — | — | US | claimed |
| US-5112890-A | Piperidine compound with oxygen bonded to ring nitrogen | CIBA-GEIGY CORPORATION (US) | 1992-05-12 | — | — | US | claimed |
| US-5064883-A | Stabilization of acid catalyzed thermoset resins with n-hydroxy hindered amines | CIBA-GEIGY CORPORATION (US) | 1991-11-12 | — | — | US | claimed |
| US-5006577-A | Durable, weatherproof | CIBA-GEIGY CORPORATION (US) | 1991-04-09 | — | — | US | claimed |
| EP-0309401-A1 | Stabilization of coatings with N-hydroxy hindered amines | CIBA-GEIGY AG (CH) | 1989-03-29 | — | — | EP | claimed |
| EP-0309402-A1 | N-substituted hindered amine stabilizers | CIBA-GEIGY AG (CH) | 1989-03-29 | — | — | EP | claimed |
| US-4477614-A | FOR POLYAMIDES | CIBA-GEIGY CORPORATION (US) | 1984-10-16 | — | — | US | claimed |
| US-4447511-A | PREVENTION IMAGE DEGRADATION DUE TO ULTRAVIOLET LIGHT | CIBA-GEIGY CORPORATION (US) | 1984-05-08 | — | — | US | claimed |
| US-4426471-A | TETRAALKYLPIPERIDINES | CIBA-GEIGY CORPORATION (US) | 1984-01-17 | — | — | US | claimed |
| EP-0015230-B1 | STABILIZED ORGANIC POLYMER COMPRISING 2-(2-HYDROXY-3,5-DI-TERT-OCTYLPHENYL)-2H-BENZOTRIAZOLE AS A LIGHT-STABILIZER | CIBA-GEIGY AG (CH) | 1983-02-23 | — | — | EP | claimed |
| US-4283327-A | USED AS A LIGHT STABILIZER | CIBA-GEIGY CORPORATION (US) | 1981-08-11 | — | — | US | claimed |
| US-4278590-A | AUTOMOBILE FINISHES | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | claimed |
| EP-0015230-A1 | Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer | CIBA-GEIGY AG (CH) | 1980-09-03 | — | — | EP | claimed |
| US-20260132309-A1 | HARD COATING FILM, HARD COATING FILM-APPLIED SUBSTRATE, COATING MATERIAL COMPOSITION, AND WINDOW MATERIAL | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-05-14 | — | — | US | disclosed |
| US-12545808-B2 | Hard coating film, hard coating film-applied substrate, coating material composition, and window material | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-02-10 | — | — | US | disclosed |
| EP-4628540-A1 | RESIN COMPOSITION, PELLETS AND MOLDED ARTICLE | Mitsubishi Chemical Corporation (JP) | 2025-10-08 | — | — | EP | disclosed |
| EP-4628541-A1 | RESIN COMPOSITION, PELLET, MOLDED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | Mitsubishi Chemical Corporation (JP) | 2025-10-08 | — | — | EP | disclosed |
| US-20250282948-A1 | RESIN COMPOSITION, PELLET, FORMED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-09-11 | — | — | US | disclosed |
| US-20250282949-A1 | RESIN COMPOSITION, PELLET, AND FORMED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-09-11 | — | — | US | disclosed |
| EP-4574907-A1 | RESIN COMPOSITION, PELLETS, AND MOLDED ARTICLE | Mitsubishi Chemical Corporation (JP) | 2025-06-25 | — | — | EP | disclosed |
| WO-2025126784-A1 | LAYER AND STRUCTURE | ダイキン工業株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-20250188275-A1 | RESIN COMPOSITION, PELLET, AND FORMED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-06-12 | — | — | US | disclosed |
| CN-119677811-A | Resin composition, pellet and molded article | 三菱化学株式会社 | 2025-03-21 | — | — | CN | disclosed |
| EP-4520793-A1 | RESIN COMPOSITION, MOLDED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | Mitsubishi Chemical Corporation (JP) | 2025-03-12 | — | — | EP | disclosed |
| US-20250051564-A1 | RESIN COMPOSITION, MOLDED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-02-13 | — | — | US | disclosed |
| WO-2025033541-A1 | RESIN COMPOSITION, PELLETS, AND MOLDED ARTICLE | 三菱ケミカル株式会社 | 2025-02-13 | — | — | WO | disclosed |
| CN-119137214-A | Resin composition, molded article, and method for producing resin composition | 三菱化学株式会社 | 2024-12-13 | — | — | CN | disclosed |
| US-20240376323-A1 | ADHESION LAYER-APPLIED SUBSTRATE, LAMINATE, AND COATING MATERIAL COMPOSITION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-11-14 | — | — | US | disclosed |
| WO-2024117158-A1 | RESIN COMPOSITION, PELLETS AND MOLDED ARTICLE | 三菱ケミカル株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024117159-A1 | RESIN COMPOSITION, PELLET, MOLDED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | 三菱ケミカル株式会社 | 2024-06-06 | — | — | WO | disclosed |
| CN-117836138-A | Substrate with adhesive layer, laminate, and coating composition | 旭化成株式会社 | 2024-04-05 | — | — | CN | disclosed |
| US-20240085787-A1 | PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT | MURATA MANUFACTURING CO., LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| CN-117631452-A | Photosensitive paste, wiring pattern forming method, electronic component manufacturing method, and electronic component | 株式会社村田制作所 | 2024-03-01 | — | — | CN | disclosed |
| WO-2024038853-A1 | RESIN COMPOSITION, PELLETS, AND MOLDED ARTICLE | 三菱ケミカル株式会社 | 2024-02-22 | — | — | WO | disclosed |
| CN-111596524-B | Self-luminous photosensitive composition, color conversion layer, color filter and image display device | 东友精细化工有限公司 | 2024-01-30 | — | — | CN | disclosed |
| WO-2023214487-A1 | RESIN COMPOSITION, MOLDED ARTICLE, AND METHOD FOR PRODUCING RESIN COMPOSITION | 三菱ケミカル株式会社 | 2023-11-09 | — | — | WO | disclosed |
| WO-2023167197-A1 | ARTICLE AND METHOD FOR MANUFACTURING SAME, AND SURFACE TREATMENT AGENT | ダイキン工業株式会社 | 2023-09-07 | — | — | WO | disclosed |
| CN-116694202-A | Surface treatment agent, article, and method for producing article | 大金工业株式会社 | 2023-09-05 | — | — | CN | disclosed |
| CN-109964175-B | Photosensitive resin composition, color filter and image display device | 东友精细化工有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-11655354-B2 | Coating-free metallic thermoplastic resin composition having improved metallic texture and gloss | HYUNDAI MOTOR COMPANY (KR) | 2023-05-23 | — | — | US | disclosed |
| US-20230086403-A1 | LAMINATE, HARD COATING FILM, AND COATING MATERIAL COMPOSITION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-03-23 | — | — | US | disclosed |
| WO-2023038123-A1 | ADHESIVE-LAYER-EQUIPPED SUBSTRATE, LAMINATE, AND COATING COMPOSITION | 旭化成株式会社 | 2023-03-16 | — | — | WO | disclosed |
| EP-4116085-A1 | LAMINATE, HARD-COAT COATING FILM, AND COATING MATERIAL COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2023-01-11 | — | — | EP | disclosed |
| EP-3604372-B1 | POLYISOCYANATE CURING AGENT, AQUEOUS COATING COMPOSITION, COATING FILM, AND COATED ARTICLE | ASAHI CHEMICAL IND (JP) | 2022-12-14 | — | — | EP | disclosed |
| CN-115181312-A | Window material | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-115175807-A | Laminate, hard coat coating film, and coating composition | 旭化成株式会社 | 2022-10-11 | — | — | CN | disclosed |
| CN-112566991-B | Hard coat film, substrate with hard coat film, coating composition, and window material | 旭化成株式会社 | 2022-09-09 | — | — | CN | disclosed |
| CN-113826230-A | Transparent electrode, method for producing transparent electrode, and photoelectric conversion element provided with transparent electrode | 株式会社东芝 | 2021-12-21 | — | — | CN | disclosed |
| CN-110520456-B | Polyisocyanate curing agent, aqueous coating composition, coating film, and coated article | 旭化成株式会社 | 2021-12-17 | — | — | CN | disclosed |
| EP-3093300-B1 | AQUEOUS COMPOSITE PARTICLE DISPERSION | ASAHI CHEMICAL IND (JP) | 2021-11-24 | — | — | EP | disclosed |
| US-20210324232-A1 | HARD COATING FILM, HARD COATING FILM-APPLIED SUBSTRATE, COATING MATERIAL COMPOSITION, AND WINDOW MATERIAL | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2021-10-21 | — | — | US | disclosed |
| EP-3845619-A1 | HARD COATING FILM, BASE MATERIAL WITH HARD COATING FILM, COATING COMPOSITION AND WINDOW MATERIAL | Asahi Kasei Kabushiki Kaisha (JP) | 2021-07-07 | — | — | EP | disclosed |
| US-20210179838-A1 | COATING-FREE METALLIC THERMOPLASTIC RESIN COMPOSITION HAVING IMPROVED METALLIC TEXTURE AND GLOSS | BGFECOMATERIALS CO., LTD. (KR) | 2021-06-17 | — | — | US | disclosed |
| CN-112566991-A | Hard coat film, substrate with hard coat film, coating composition, and window material | 旭化成株式会社 | 2021-03-26 | — | — | CN | disclosed |
| EP-3498794-B1 | COATING COMPOSITION DISPERSION, AQUEOUS DISPERSION OF COMPOSITE-PARTICLES, AND METHOD FOR PRODUCING AQUEOUS DISPERSION OF COMPOSITE-PARTICLES | ASAHI CHEMICAL IND (JP) | 2021-02-10 | — | — | EP | disclosed |
| EP-3708625-A1 | PROCESS FOR PRODUCING AQUEOUS COMPOSITE-PARTICLE DISPERSION | Asahi Kasei Kabushiki Kaisha (JP) | 2020-09-16 | — | — | EP | disclosed |
| CN-111596524-A | Self-luminous photosensitive composition, color conversion layer, color filter and image display device | 东友精细化工有限公司 | 2020-08-28 | — | — | CN | disclosed |
| EP-3604372-A1 | POLYISOCYANATE CURING AGENT, AQUEOUS COATING COMPOSITION, COATING FILM, AND COATED ARTICLE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-3498794-A1 | COATING COMPOSITION DISPERSION, AQUEOUS COMPOSITE-PARTICLE DISPERSION, AND PROCESS FOR PRODUCING AQUEOUS COMPOSITE-PARTICLE DISPERSION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-06-19 | — | — | EP | disclosed |
| US-20190169458-A1 | COATING COMPOSITION DISPERSION, AQUEOUS DISPERSION OF COMPOSITE PARTICLES AND METHOD FOR PRODUCING AQUEOUS DISPERSION OF COMPOSITE PARTICLES | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-06-06 | — | — | US | disclosed |
| EP-3424993-A1 | RESIN ADDITIVE COMPOSITION, THERMOPLASTIC RESIN COMPOSITION, AND MOLDED ARTICLE THEREOF | Adeka Corporation (JP) | 2019-01-09 | — | — | EP | disclosed |
| US-20160333189-A1 | AQUEOUS COMPOSITE PARTICLE DISPERSION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2016-11-17 | — | — | US | disclosed |
| EP-3093300-A1 | AQUEOUS COMPOSITE PARTICLE DISPERSION | Asahi Kasei Kabushiki Kaisha (JP) | 2016-11-16 | — | — | EP | disclosed |
| EP-2816087-B1 | Aqueous organic-inorganic hybrid composition | ASAHI CHEMICAL IND (JP) | 2016-11-09 | — | — | EP | disclosed |
| EP-2722896-B1 | SHEET FOR PHOTOVOLTAIC CELL | LG CHEMICAL LTD (KR) | 2016-11-02 | — | — | EP | disclosed |
| US-9403950-B2 | Aqueous organic-inorganic hybrid composition | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-08-02 | — | — | US | disclosed |
| EP-1956049-B1 | AQUEOUS ORGANIC-INORGANIC HYBRID COMPOSITION | ASAHI KASEI CHEMICALS CORP (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2816087-A1 | Aqueous organic-inorganic hybrid composition | Asahi Kasei Chemicals Corporation (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-20140174523-A1 | SHEET FOR PHOTOVOLTAIC CELL | LG CHEM, LTD. (KR) | 2014-06-26 | — | — | US | disclosed |
| EP-2722896-A2 | SHEET FOR PHOTOVOLTAIC CELL | LG Chem, Ltd. (KR) | 2014-04-23 | — | — | EP | disclosed |
| EP-1473331-B1 | ANTIFOULING WATER-BASED COATING COMPOSITION | ASAHI KASEI CHEMICALS CORP (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-8178113-B2 | Aloe vera gel; glycolic acid, lactic acid, salicylic acid, gluconolactone exfoliants; vitamin C; vitamin A; vitamin E; buffering agent; preservative; applied to skin once or twice a day | ABDULLAH SHEIKH AHMED (US) | 2012-05-15 | — | — | US | disclosed |
| US-8163934-B2 | Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole | CHANG CHIA-HU (US) | 2012-04-24 | — | — | US | disclosed |
| US-20110262738-A1 | Aqueous Organic-Inorganic Hybrid Composition | NIGUMA TATSURO | 2011-10-27 | — | — | US | disclosed |
| US-8013055-B2 | Aqueous organic-inorganic hybrid composition | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| US-7968632-B2 | Polycarbonate resin composition and process for producing thereof | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2011-06-28 | — | — | US | disclosed |
| EP-2332013-A1 | ULTRAVIOLET LIGHT ABSORBING KETONES OF 2-(2-HYDROXYPHENYL) BENZOTRIAZOLE | Chang, Chia-Hu (US) | 2011-06-15 | — | — | EP | disclosed |
| US-20110038816-A1 | Ultraviolet light absorbing ketones of 2-(2-hydroxyhenyl) benzotriazole | CHANG CHIA-HU | 2011-02-17 | — | — | US | disclosed |
| US-20110023945-A1 | LAMINATE FOR A SOLAR BATTERY BACK-SHEET AND BACK-SHEET COMPRISNG SAME | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| EP-2273560-A1 | LAMINATE FOR SOLAR BATTERY BACK-SHEET, AND BACK-SHEET COMPRISING THE SAME | Asahi Kasei Chemicals Corporation (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-7847103-B2 | Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole | CHANG CHIA-HU | 2010-12-07 | — | — | US | disclosed |
| EP-1892266-B1 | POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLES | MITSUBISHI ENG PLASTICS CORP (JP) | 2010-07-21 | — | — | EP | disclosed |
| US-20100086500-A1 | Ultraviolet light absorbing ketones of 2-(2-Hydroxyphenyl) benzotriazole | CHANG CHIA-HU | 2010-04-08 | — | — | US | disclosed |
| WO-2010039229-A1 | ULTRAVIOLET LIGHT ABSORBING KETONES OF 2-(2-HYDROXYPHENYL) BENZOTRIAZOLE | CHANG CHIA-HU (US) | 2010-04-08 | — | — | WO | disclosed |
| US-20090286068-A1 | AQUEOUS ORGANIC-INORGANIC HYBRID COMPOSITION | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090186967-A1 | Polycarbonate resin composition and process for producing thereof | MITSUBISHI ENGINEERING PLASTICS CORPORATION (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20080241291-A1 | Cosmetic Composition and Methods of Use | ABDULLAH SHEIKH AHMED | 2008-10-02 | — | — | US | disclosed |
| EP-1972323-A2 | Hair colorant | Henkel AG & Co. KGaA (DE) | 2008-09-24 | — | — | EP | disclosed |
| EP-1956049-A1 | AQUEOUS ORGANIC-INORGANIC HYBRID COMPOSITION | Asahi Kasei Chemicals Corporation (JP) | 2008-08-13 | — | — | EP | disclosed |
| EP-1892266-A1 | POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLES | Mitsubishi Engineering-Plastics Corporation (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-7074906-B2 | Organic solvent-free process for the preparation of 2-(2-nitrophenylazo)phenols | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2006-07-11 | — | — | US | disclosed |
| US-20050053562-A1 | Organic solvent-free process for the preparation of 2-(2-nitrophenylazo)phenols | CIBA SPECIALTY CHEMICALS CORP. | 2005-03-10 | — | — | US | disclosed |
| US-6815550-B2 | DIAZOTIZING A 5-PERFLUOROALKYL-O-NITROANILINE WITH SULFURIC ACID AND ALKALI METAL NITRITE OR NITROSYLSULFURIC ACID; COUPLING WITH A PHENOL; AND REDUCING THE MONOAZOBENZENE INTERMEDIATE TO THE CORRESPONDING 2H-BENZOTRIAZOLE | CIBA SPECIALTY CHEMICALS CORPORATION | 2004-11-09 | — | — | US | disclosed |
| EP-1473331-A1 | ANTIFOULING WATER-BASED COATING COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2004-11-03 | — | — | EP | disclosed |
| EP-1451254-A1 | ORGANIC SOLVENT-FREE PROCESS FOR THE PREPARATION OF 2-(2-NITROPHENYLAZO)PHENOLS | Ciba SC Holding AG (CH) | 2004-09-01 | — | — | EP | disclosed |
| US-6762250-B2 | TRANSPARENCY, FLUIDITY; CONTAINING POLYSILOXANE HAVING AT LEAST AROMATIC HYDROCARBON FUNCTIONALITY, CARBOXYLIC ACID ESTER AND/OR ETHER LINKAGES AND PHOSPHORIC ESTER GROUP ATTACHMENT | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-07-13 | — | — | US | disclosed |
| US-6727294-B2 | RADIATION TRANSPARENT MOLDING MATERIALS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20040054116-A1 | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORPORATION | 2004-03-18 | — | — | US | disclosed |
| US-6605727-B2 | Processes for the preparation of benzotriazole UV absorbers | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-08-12 | — | — | US | disclosed |
| US-20030130524-A1 | Processes for the preparation of benzotriazole UV absorbers | WOOD MERVIN G (US) | 2003-07-10 | — | — | US | disclosed |
| US-20030120083-A1 | Processes for the preparation of benzotriazole UV absorbers | WOOD MERVIN G (US) | 2003-06-26 | — | — | US | disclosed |
| WO-2003048257-A1 | ORGANIC SOLVENT-FREE PROCESS FOR THE PREPARATION OF 2-(2-NITROPHENYLAZO)PHENOLS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-06-12 | — | — | WO | disclosed |
| US-6566507-B2 | Processes for the preparation of benzotriazole UV absorbers | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-05-20 | — | — | US | disclosed |
| EP-1305298-A2 | PROCESSES FOR THE PREPARATION OF BENZOTRIAZOLE UV ABSORBERS | Ciba SC Holding AG (CH) | 2003-05-02 | — | — | EP | disclosed |
| EP-0309402-B2 | N-substituted hindered amine stabilizers | CIBA SC HOLDING AG (CH) | 2002-06-12 | — | — | EP | disclosed |
| EP-0309401-B2 | Stabilization of coatings with N-hydroxy hindered amines | CIBA SC HOLDING AG (CH) | 2002-06-05 | — | — | EP | disclosed |
| US-6365139-B2 | Cosmetic stick | AVON PRODUCTS, INC. | 2002-04-02 | — | — | US | disclosed |
| US-20020035175-A1 | Processes for the preparation of benzotriazole UV absorbers | CIBA SPECIALTY CHEMICALS CORP. | 2002-03-21 | — | — | US | disclosed |
| WO-2002012202-A2 | PROCESSES FOR THE PREPARATION OF BENZOTRIAZOLE UV ABSORBERS | CIBA SPECIALTY CHEMICALS HOLDINGS INC. (CH) | 2002-02-14 | — | — | WO | disclosed |
| US-20010034419-A1 | Radiation transparent molding materials | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010008633-A1 | Cosmetic stick | AVON PRODUCTS, INC. | 2001-07-19 | — | — | US | disclosed |
| US-6183760-B1 | Cosmetic stick | AVON PRODUCTS, INC. | 2001-02-06 | — | — | US | disclosed |
| EP-1018332-A2 | Cosmetic stick | AVON PRODUCTS, INC. (US) | 2000-07-12 | — | — | EP | disclosed |
| EP-0764686-B1 | Hybrid s-triazine light stabilizers substituted by benzotriazole or benzophenone moieties and compositions stabilized therewith | CIBA GEIGY AG (CH) | 1999-06-16 | — | — | EP | disclosed |
| US-5679794-A | ACTINIC LIGHT RESISTANCE, PROCESSING HEAT RESISTANCE | CIBA-GEIGY CORPORATION (US) | 1997-10-21 | — | — | US | disclosed |
| US-5668198-A | Polymer stabilizers containing both hindered amine and hydroxylamine moieties | CIBA-GEIGY CORPORATION (US) | 1997-09-16 | — | — | US | disclosed |
| US-5668199-A | Polymer stabilizers containing both hindered amine and hydroxylamine moieties | CIBA-GEIGY CORPORATION (US) | 1997-09-16 | — | — | US | disclosed |
| EP-0764686-A1 | Hybrid s-triazine light stabilizers substituted by benzotriazole or benzophenone moieties and compositions stabilized therewith | Ciba SC Holding AG (CH) | 1997-03-26 | — | — | EP | disclosed |
| US-5607987-A | PHOTOSTABILITY FOR ELECTROCOATING OR CLEAR FINISHES | CIBA-GEIGY CORPORATION (US) | 1997-03-04 | — | — | US | disclosed |
| US-5585422-A | PROTECT POLYMERS FROM DELETERIOUS EFFECTS OF ACTINIC RADIATION AS WELL AS GOOD RESISTANCE TO LOSS BY VOLATILIZATION DURING PROCESSING | CIBA-GEIGY CORPORATION (US) | 1996-12-17 | — | — | US | disclosed |
| US-5574162-A | CONTAIN REACTIVE FUNCTIONAL GROUP, I.E., HYDROXY, AMINO, ISOCYANATO, GLYCIDYLOXY, TRIHYDROXYSILYL OR TRIALKOXYSILYL, WHICH CAN BE CHEMICALLY ATTACHED TO POLYMER SUBSTRATES | CIBA-GEIGY CORPORATION (US) | 1996-11-12 | — | — | US | disclosed |
| US-5574166-A | PHOTOSTABILITY FOR STORAGE STABILITY, HEAT RESISTANCE, OXIDATION RESISTANCE AND RADIATION RESISTANCE | CIBA-GEIGY CORPORATION (US) | 1996-11-12 | — | — | US | disclosed |
| EP-0738718-A1 | 2-(2-Hydroxy-3-alpha-cumyl-5-alkylphenyl)-2h-benzotriazoles useful as light stabilisers | CIBA-GEIGY AG (CH) | 1996-10-23 | — | — | EP | disclosed |
| US-5563242-A | LIGHT STABILITY | CIBA-GEIGY CORPORATION (US) | 1996-10-08 | — | — | US | disclosed |
| US-5554760-A | ULTRAVIOLET RADIATION ABSORBERS; POLYMER FILM COATINGS | CIBA-GEIGY CORPORATION (US) | 1996-09-10 | — | — | US | disclosed |
| US-5552464-A | RADIATION AND HEAT RESISTANT POLYMERS WITH DERIVATIVES OF TETRAMETHYLPIPERIDINE AND HYDROXYLAMINES | CIBA-GEIGY CORPORATION (US) | 1996-09-03 | — | — | US | disclosed |
| EP-0613891-B1 | 2-(Benzotriazol-2-yl)-4-alkyl-6-(2-hydroxy-3-benzoylbenzyl)phenols and stabilized compositions | CIBA GEIGY AG (CH) | 1996-08-28 | — | — | EP | disclosed |
| EP-0389419-B1 | Non-migrating 1-hydrocarbyloxy hindered amine compounds as polymer stabilizers | CIBA GEIGY AG (CH) | 1996-05-01 | — | — | EP | disclosed |
| US-5442071-A | Photostability | CIBA-GEIGY CORPORATION (US) | 1995-08-15 | — | — | US | disclosed |
| EP-0389424-B1 | 1-Hydrocarbyloxy hindered amine mercaptoacid esters, thioacetals, sulfides and disulfides | CIBA GEIGY AG (CH) | 1995-06-07 | — | — | EP | disclosed |
| US-5410047-A | A 2-hydroxyamino-4,6-substituted triazine as light stabilizers for polymers; radiation resistance, oxidation resistance, discoloration inhibition | CIBA-GEIGY CORPORATION (US) | 1995-04-25 | — | — | US | disclosed |
| EP-0413665-B1 | Polymer stabilizers containing both hindered amine and nitrone moieties | CIBA GEIGY AG (CH) | 1995-04-05 | — | — | EP | disclosed |
| EP-0309402-B1 | N-substituted hindered amine stabilizers | CIBA GEIGY AG (CH) | 1995-01-11 | — | — | EP | disclosed |
| EP-0309401-B1 | Stabilization of coatings with N-hydroxy hindered amines | CIBA GEIGY AG (CH) | 1994-10-26 | — | — | EP | disclosed |
| EP-0389430-B1 | N-hydrocarbyloxy hindered amine light stabilizers substituted with phosphorus moieties | CIBA GEIGY AG (CH) | 1994-10-26 | — | — | EP | disclosed |
| US-5359069-A | Non-migrating 1-hydrocarbyloxy hindered amine derivatives as polymer stabilizers | CIBA-GEIGY CORPORATION (US) | 1994-10-25 | — | — | US | disclosed |
| EP-0389422-B1 | Stabilizers derived from N-hydroxy hindered amines by Michael addition reactions | CIBA GEIGY AG (CH) | 1994-09-21 | — | — | EP | disclosed |
| EP-0389432-B1 | Hindered amine derivatives of triazine and hexahydrotriazine | CIBA GEIGY AG (CH) | 1994-09-21 | — | — | EP | disclosed |
| EP-0389420-B1 | Ethylenically unsaturated compounds containing 1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidine moieties, and polymers, copolymers and stabilized compositions | CIBA GEIGY AG (CH) | 1994-09-21 | — | — | EP | disclosed |
| EP-0389434-B1 | Bis(1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidin-4-yl)-amine Derivatives and Stabilized compositions | CIBA GEIGY AG (CH) | 1994-09-21 | — | — | EP | disclosed |
| EP-0389429-B1 | Azo compounds containing hindered amine moieties with low basicity | CIBA GEIGY AG (CH) | 1994-09-21 | — | — | EP | disclosed |
| EP-0337942-B1 | Liquid substituted 2H-benzotriazole mixtures | CIBA GEIGY AG (CH) | 1994-07-06 | — | — | EP | disclosed |
| US-5312852-A | 2-(2-hydroxy-3-perfluoroalkylthiomethyl-5-alkylphenyl)-2H-benzotriazoles, processes for preparing them and stabilized compositions thereof | CIBA-GEIGY CORPORATION (US) | 1994-05-17 | — | — | US | disclosed |
| EP-0389431-B1 | N-Hydrocarbyloxy derivatives of hindered amine-substituted s-triazines | CIBA GEIGY AG (CH) | 1994-04-27 | — | — | EP | disclosed |
| EP-0389423-B1 | Peroxide compounds containing hindered amine moieties with low basicity | CIBA GEIGY AG (CH) | 1994-04-27 | — | — | EP | disclosed |
| EP-0389421-B1 | Poly(1-hydrocarbyloxy-2,2,6,6-tetraalkylpiperidine) light stabilizers | CIBA GEIGY AG (CH) | 1994-04-27 | — | — | EP | disclosed |
| EP-0309400-B1 | N-acyloxy hindered amine stabilizers | CIBA GEIGY AG (CH) | 1994-03-02 | — | — | EP | disclosed |
| US-5286865-A | Contain reactive functional group which can be chemically attached to selected polymer substrates | CIBA-GEIGY CORPORATION (US) | 1994-02-15 | — | — | US | disclosed |
| EP-0582549-A2 | 2-(2-hydroxy-3-perfluoroalkylthio-methyl-5-alkylphenyl)-2H-benzo triazoles, processes for preparing them and stabilized compositions thereof | CIBA-GEIGY AG (CH) | 1994-02-09 | — | — | EP | disclosed |
| US-5250698-A | Ultra violet radiation absorbers for plastic surfaces | CIBA-GEIGY CORPORATION (US) | 1993-10-05 | — | — | US | disclosed |
| EP-0427672-B1 | POLYMER STABILIZERS CONTAINING BOTH HINDERED AMINE AND HYDROXYLAMINE MOIETIES | CIBA-GEIGY AG (CH) | 1993-09-29 | — | — | EP | disclosed |
| US-5240975-A | Photostability | CIBA-GEIGY CORPORATION (US) | 1993-08-31 | — | — | US | disclosed |
| US-5204422-A | Peroxide free radical initiators containing hindered amine moieties with low basicity | CIBA-GEIGY CORPORATION (US) | 1993-04-20 | — | — | US | disclosed |
| US-5202441-A | Heat resistance, photostability | CIBA-GEIGY CORPORATION (US) | 1993-04-13 | — | — | US | disclosed |
| US-5189086-A | Polysubstituted N-hydrocarbyloxy hindered amine light stabilizers | CIBA-GEIGY CORPORATION (US) | 1993-02-23 | — | — | US | disclosed |
| US-5145893-A | Photostability | CIBA-GEIGY CORPORATION (US) | 1992-09-08 | — | — | US | disclosed |
| US-5140081-A | Peroxide free radical initiators containing hindered amine moieties with low basicity | CIBA-GEIGY CORPORATION (US) | 1992-08-18 | — | — | US | disclosed |
| US-5124378-A | Resin containign N-Hydroxyl hindered amine oxidative and light stabilizers | CIBA-GEIGY CORPORATION (US) | 1992-06-23 | — | — | US | disclosed |
| US-5118736-A | Polymer stabilization against actinic radiation | CIBA-GEIGY CORPORATION (US) | 1992-06-02 | — | — | US | disclosed |
| EP-0487485-A2 | Weather-resistant powder coating compositions | U C B, S.A. (BE) | 1992-05-27 | — | — | EP | disclosed |
| US-5112890-A | Piperidine compound with oxygen bonded to ring nitrogen | CIBA-GEIGY CORPORATION (US) | 1992-05-12 | — | — | US | disclosed |
| EP-0189374-B1 | LIQUID MIXTURES OF 2-(HYDROXY-3-BRANCHED ALKYL-5-METHYLPHENYL)-2H-BENZOTRIAZOLE, PROCESS FOR THEIR PREPARATION AND STABILIZED COMPOSITIONS CONTAINING THEM | CIBA-GEIGY AG (CH) | 1992-03-18 | — | — | EP | disclosed |
| US-5096950-A | N-alkoxypiperidines | CIBA-GEIGY CORPORATION (US) | 1992-03-17 | — | — | US | disclosed |
| US-5097006-A | Polyesters | U C B S.A. (BE) | 1992-03-17 | — | — | US | disclosed |
| US-5095062-A | Photostability | CIBA-GEIGY CORPORATION (US) | 1992-03-10 | — | — | US | disclosed |
| US-5077340-A | Ethylenically unsaturated compounds containing 1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidine moieties, and polymers, copolymers and stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1991-12-31 | — | — | US | disclosed |
| US-5064883-A | Stabilization of acid catalyzed thermoset resins with n-hydroxy hindered amines | CIBA-GEIGY CORPORATION (US) | 1991-11-12 | — | — | US | disclosed |
| US-5051511-A | Hindered amine light stabilizers and polymerization catalysts | CIBA-GEIGY CORPORATION (US) | 1991-09-24 | — | — | US | disclosed |
| US-5047489-A | Ethylenically unsaturated compounds containing 1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidine moieties, and polymers, copolymers and stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1991-09-10 | — | — | US | disclosed |
| US-5026750-A | Photostabilizers for polymer substrates | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |
| US-5021483-A | Light stabilizers | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5021481-A | For use with polymers | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5021486-A | Oxidation, heat and radiation resistance | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5021478-A | For polymers | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5021577-A | For polymers | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5021480-A | Azo free radical initiators containing hindered amine moieties with low basicity | CIBA-GEIGY CORPORATION (US) | 1991-06-04 | — | — | US | disclosed |
| US-5019613-A | Light stabilizers | CIBA-GEIGY CORPORATION (US) | 1991-05-28 | — | — | US | disclosed |
| EP-0427672-A1 | Polymer stabilizers containing both hindered amine and hydroxylamine moieties | CIBA-GEIGY AG (CH) | 1991-05-15 | — | — | EP | disclosed |
| US-5015678-A | Light stabilized polymers by the addition of N-hydoxyamines | CIBA-GEIGY CORPORATION (US) | 1991-05-14 | — | — | US | disclosed |
| US-5015683-A | Acting radiation resistance | CIBA-GEIGY CORPORATION (US) | 1991-05-14 | — | — | US | disclosed |
| US-5015682-A | Oligomeric N-hydrocarbyloxy hindered amine light stabilizers | CIBA-GEIGY CORPORATION (US) | 1991-05-14 | — | — | US | disclosed |
| US-5006577-A | Durable, weatherproof | CIBA-GEIGY CORPORATION (US) | 1991-04-09 | — | — | US | disclosed |
| US-5004770-A | Light, heat, and oxygen resistant | CIBA-GEIGY CORPORATION (US) | 1991-04-02 | — | — | US | disclosed |
| EP-0413665-A2 | Polymer stabilizers containing both hindered amine and nitrone moieties | CIBA-GEIGY AG (CH) | 1991-02-20 | — | — | EP | disclosed |
| US-4983737-A | LIGHT STABILIZERS FOR POLYMERIC SUBSTRATES | CIBA-GEIGY CORPORATION (US) | 1991-01-08 | — | — | US | disclosed |
| US-RE33489-E | LIGHT STABILIZERS | CIBA-GEIGY CORPORATION (US) | 1990-12-11 | — | — | US | disclosed |
| US-4973701-A | LIGHT STABILIZERS FOR PHOTOGRAPHY AND POLYMERS | CIBA-GEIGY CORPORATION (US) | 1990-11-27 | — | — | US | disclosed |
| US-4972009-A | PHOTOSTABILIZERS FOR POLYMERS, RADIATION RESISTANCE | CIBA-GEIGY CORPORATION (US) | 1990-11-20 | — | — | US | disclosed |
| EP-0389434-A1 | Bis(1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidin-4-yl)-amine Derivatives and Stabilized compositions | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389429-A2 | Azo compounds containing hindered amine moieties with low basicity | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389423-A1 | Peroxide compounds containing hindered amine moieties with low basicity | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389422-A2 | Stabilizers derived from N-hydroxy hindered amines by Michael addition reactions | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389430-A1 | N-hydrocarbyloxy hindered amine light stabilizers substituted with phosphorus moieties | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389419-A1 | Non-migrating 1-hydrocarbyloxy hindered amine compounds as polymer stabilizers | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389431-A2 | N-Hydrocarbyloxy derivatives of hindered amine-substituted s-triazines | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389421-A1 | Poly(1-hydrocarbyloxy-2,2,6,6-tetraalkylpiperidine) light stabilizers | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389432-A2 | Hindered amine derivatives of triazine and hexahydrotriazine | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389424-A1 | 1-Hydrocarbyloxy hindered amine mercaptoacid esters, thioacetals, sulfides and disulfides | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| EP-0389428-A2 | N,N-Bis(l-hydroxycarbyloxy-2,2,6,6-tetramethyl-piperidin-4-yl) amino triazines and stabilized compositions | CIBA-GEIGY AG (CH) | 1990-09-26 | — | — | EP | disclosed |
| US-4952620-A | STABILIZERS FOR ACID CURABLE RESINS | CIBA-GEIGY CORPORATION (US) | 1990-08-28 | — | — | US | disclosed |
| EP-0365481-A1 | Polymeric substrates stabilized with N-substituted hindered amines | CIBA-GEIGY AG (CH) | 1990-04-25 | — | — | EP | disclosed |
| US-4904712-A | PHOTOSTABILIZERS/AGENTS/ | CIBA-GEIGY CORPORATION (US) | 1990-02-27 | — | — | US | disclosed |
| US-4891424-A | INTERMEDIATES FOR BENZOTRIAZOLE STABILIZERS | CIBA-GEIGY CORPORATION (US) | 1990-01-02 | — | — | US | disclosed |
| EP-0337942-A1 | Liquid substituted 2H-benzotriazole mixtures | CIBA-GEIGY AG (CH) | 1989-10-18 | — | — | EP | disclosed |
| US-4861813-A | 5-Aralkyl substituted 2h-benzotriazoles in stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1989-08-29 | — | — | US | disclosed |
| EP-0323803-A1 | Stabilization of coatings by N-formylated hindered amines | CIBA-GEIGY AG (CH) | 1989-07-12 | — | — | EP | disclosed |
| US-4847367-A | PHOTOSTABILIZERS, CHEMICAL INTERMEDIATE | CIBA-GEIGY CORPORATION (US) | 1989-07-11 | — | — | US | disclosed |
| EP-0309402-A1 | N-substituted hindered amine stabilizers | CIBA-GEIGY AG (CH) | 1989-03-29 | — | — | EP | disclosed |
| EP-0309400-A2 | N-acyloxy hindered amine stabilizers | CIBA-GEIGY AG (CH) | 1989-03-29 | — | — | EP | disclosed |
| US-4785102-A | PHOTOSTABILIZERS FOR POLYMERS | CIBA-GEIGY CORPORATION (US) | 1988-11-15 | — | — | US | disclosed |
| US-4760148-A | 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1988-07-26 | — | — | US | disclosed |
| US-4727158-A | PHOTOSTABILITY | CIBA-GEIGY CORPORATION (US) | 1988-02-23 | — | — | US | disclosed |
| EP-0052073-B1 | LIGHT STABILIZATION OF ACID CATALYSED STORING ENAMELS | CIBA-GEIGY AG (CH) | 1987-08-19 | — | — | EP | disclosed |
| US-4675352-A | PHOTOSTABILITY | CIBA-GEIGY CORPORATION (US) | 1987-06-23 | — | — | US | disclosed |
| EP-0189374-A2 | Liquid mixtures of 2-(hydroxy-3-branched alkyl-5-methylphenyl)-2H-benzotriazole, process for their preparation and stabilized compositions containing them | CIBA-GEIGY AG (CH) | 1986-07-30 | — | — | EP | disclosed |
| US-4587346-A | ALKYLATION WITH ALKENE AND ACID CATALYST | CIBA-GEIGY CORPORATION (US) | 1986-05-06 | — | — | US | disclosed |
| US-4477614-A | FOR POLYAMIDES | CIBA-GEIGY CORPORATION (US) | 1984-10-16 | — | — | US | disclosed |
| US-4477614-A | FOR POLYAMIDES | CIBA-GEIGY CORPORATION (US) | 1984-10-16 | — | — | US | disclosed |
| US-4477614-A | FOR POLYAMIDES | CIBA-GEIGY CORPORATION (US) | 1984-10-16 | — | — | US | disclosed |
| US-4447511-A | PREVENTION IMAGE DEGRADATION DUE TO ULTRAVIOLET LIGHT | CIBA-GEIGY CORPORATION (US) | 1984-05-08 | — | — | US | disclosed |
| US-4447511-A | PREVENTION IMAGE DEGRADATION DUE TO ULTRAVIOLET LIGHT | CIBA-GEIGY CORPORATION (US) | 1984-05-08 | — | — | US | disclosed |
| US-4447511-A | PREVENTION IMAGE DEGRADATION DUE TO ULTRAVIOLET LIGHT | CIBA-GEIGY CORPORATION (US) | 1984-05-08 | — | — | US | disclosed |
| US-4383863-A | 2-[2-Hydroxy-3,5-di-tert-octylphenyl]-2H-benzotriazole in stabilized photographic compositions | CIBA-GEIGY CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |
| US-4383863-A | 2-[2-Hydroxy-3,5-di-tert-octylphenyl]-2H-benzotriazole in stabilized photographic compositions | CIBA-GEIGY CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |
| US-4383863-A | 2-[2-Hydroxy-3,5-di-tert-octylphenyl]-2H-benzotriazole in stabilized photographic compositions | CIBA-GEIGY CORPORATION (US) | 1983-05-17 | — | — | US | disclosed |
| EP-0015230-B1 | STABILIZED ORGANIC POLYMER COMPRISING 2-(2-HYDROXY-3,5-DI-TERT-OCTYLPHENYL)-2H-BENZOTRIAZOLE AS A LIGHT-STABILIZER | CIBA-GEIGY AG (CH) | 1983-02-23 | — | — | EP | disclosed |
| EP-0015230-B1 | STABILIZED ORGANIC POLYMER COMPRISING 2-(2-HYDROXY-3,5-DI-TERT-OCTYLPHENYL)-2H-BENZOTRIAZOLE AS A LIGHT-STABILIZER | CIBA-GEIGY AG (CH) | 1983-02-23 | — | — | EP | disclosed |
| US-4283327-A | USED AS A LIGHT STABILIZER | CIBA-GEIGY CORPORATION (US) | 1981-08-11 | — | — | US | disclosed |
| US-4283327-A | USED AS A LIGHT STABILIZER | CIBA-GEIGY CORPORATION (US) | 1981-08-11 | — | — | US | disclosed |
| US-4283327-A | USED AS A LIGHT STABILIZER | CIBA-GEIGY CORPORATION (US) | 1981-08-11 | — | — | US | disclosed |
| US-4278589-A | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| US-4278590-A | AUTOMOBILE FINISHES | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| US-4278590-A | AUTOMOBILE FINISHES | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| US-4278590-A | AUTOMOBILE FINISHES | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| EP-0015230-A1 | Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer | CIBA-GEIGY AG (CH) | 1980-09-03 | — | — | EP | disclosed |
| EP-0015230-A1 | Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer | CIBA-GEIGY AG (CH) | 1980-09-03 | — | — | EP | disclosed |
| EP-0015230-A1 | Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer | CIBA-GEIGY AG (CH) | 1980-09-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12545808-B2 | Hard coating film, hard coating film-applied substrate, coating material composition, and window material | COL14A1, CD69, COL2A1 | NPC1 883/4885RAB9A 2405/4885LMNA 173/4885 |
| US-20020035175-A1 | Processes for the preparation of benzotriazole UV absorbers | SULT1A1, SULT2A1, NISCH | NPC1 1521/4885RAB9A 4678/4885LMNA 1811/4885 |
| US-20260132309-A1 | HARD COATING FILM, HARD COATING FILM-APPLIED SUBSTRATE, COATING MATERIAL COMPOSITION, AND WINDOW MATERIAL | SMARCA4, H1-10, SMARCA1 | NPC1 1848/4885RAB9A 3045/4885LMNA 907/4885 |
| US-20050053562-A1 | Organic solvent-free process for the preparation of 2-(2-nitrophenylazo)phenols | HPD, CYP8B1, CYP3A4 | NPC1 652/4885RAB9A 4526/4885LMNA 1570/4885 |
| US-20030120083-A1 | Processes for the preparation of benzotriazole UV absorbers | SULT1A1, SULT2A1, NISCH | NPC1 1521/4885RAB9A 4678/4885LMNA 1811/4885 |
| US-20030130524-A1 | Processes for the preparation of benzotriazole UV absorbers | SULT1A1, SULT2A1, NISCH | NPC1 1521/4885RAB9A 4678/4885LMNA 1811/4885 |
| US-20110038816-A1 | Ultraviolet light absorbing ketones of 2-(2-hydroxyhenyl) benzotriazole | HCRTR2, HCRTR1, POLL | NPC1 2019/4885RAB9A 4833/4885LMNA 2395/4885 |
| US-20100086500-A1 | Ultraviolet light absorbing ketones of 2-(2-Hydroxyphenyl) benzotriazole | HCRTR2, HCRTR1, PAH | NPC1 1975/4885RAB9A 4829/4885LMNA 2377/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.