SCHEMBL6741091

SCHEMBL6741091

Nc1ccc(S(=O)(=O)c2ccc(N)c(C(=O)O)c2Oc2ccccc2)c(Oc2ccccc2)c1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 1/20 0.41
KDM4E B2RXH2 3/20 0.39
ALDH1A1 P00352 3/20 0.39
HPGD P15428 3/20 0.39
USP2 O75604 2/20 0.39
LMNA P02545 2/20 0.39
HIF1A Q16665 2/20 0.39
HSD17B10 Q99714 2/20 0.39
SLC6A4 P31645 1/20 0.39
CA2 P00918 5/20 0.39
CA1 P00915 4/20 0.39
CA12 O43570 3/20 0.39
CA7 P43166 1/20 0.39
CA13 Q8N1Q1 1/20 0.39
GAA P10253 2/20 0.38
CA9 Q16790 3/20 0.37
SOS1 Q07889 1/20 0.37
PARP10 Q53GL7 1/20 0.37
TSHR P16473 1/20 0.36
BLM P54132 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6735347 0.81 CA1 (0.41) CDC25BKDM4EALDH1A1HPGDUSP2
SCHEMBL30618213 0.81 CA1 (0.42) CDC25BKDM4ELMNACA2CA1
SCHEMBL3272221 0.81 CA1 (0.42) CDC25BKDM4ELMNACA2CA1
SCHEMBL6741084 0.76 ADORA2A (0.42) KDM4EALDH1A1HSD17B10CA2CA1
SCHEMBL8772881 0.76 GAA (0.53) CA2CA1CA12CA7CA13
SCHEMBL461322 0.76 GAA (0.53) CA2CA1CA12CA7CA13
SCHEMBL28934029 0.75 CDC25B (0.53) CDC25BKDM4EALDH1A1HPGDUSP2
SCHEMBL1662788 0.74 HTR6 (0.50) KDM4EALDH1A1HPGDCA2CA1
SCHEMBL28212637 0.74 MAOA (0.43) ALDH1A1HSD17B10GAAPARP10SRD5A2
SCHEMBL502558 0.74 GAA (0.40) LMNACA2CA1CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6686106-B2 POLYIMIDESILOXANE COPOLYMERS UBE INDUSTRIES, LTD. (JP) 2004-02-03 US disclosed
US-20020001763-A1 Photosensitive resin compositions, insulating films, and processes for formation of the films UBE INDUSTRIES, LTD. 2002-01-03 US disclosed