Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 6/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | ADH1B | P00325 | 1/20 | 0.36 |
| ▸ | ADH1C | P00326 | 1/20 | 0.36 |
| ▸ | ADH1A | P07327 | 1/20 | 0.36 |
| ▸ | ADH4 | P08319 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6743430 | 0.97 | ALDH1A1 (0.40) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL6744540 | 0.91 | — | — | |
| SCHEMBL6746289 | 0.84 | — | — | |
| SCHEMBL451991 | 0.82 | ALDH1A1 (0.45) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL9180883 | 0.82 | ALDH1A1 (0.45) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL6903309 | 0.78 | ALDH1A1 (0.41) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL888616 | 0.75 | ALDH1A1 (0.50) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL11059965 | 0.74 | ALDH1A1 (0.38) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL4210578 | 0.74 | ALDH1A1 (0.38) | ALDH1A1HSD17B10SIGMAR1EPHX1CYP3A4 | |
| SCHEMBL14028836 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4013903-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2022-06-22 | — | — | EP | claimed |
| WO-2021050368-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| US-10242864-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2019-03-26 | — | — | US | claimed |
| CN-103374708-B | High temperature atomic layer deposition of silicon oxide thin films | 气体产品与化学公司 | 2017-05-17 | — | — | CN | claimed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| US-20250372367-A1 | DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER | LAM RES CORP (US) | 2025-12-04 | — | — | US | disclosed |
| US-20250197996-A1 | LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE | LAM RES CORP (US) | 2025-06-19 | — | — | US | disclosed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| CN-114867888-B | Method for depositing film | 弗萨姆材料美国有限责任公司 | 2025-05-30 | — | — | CN | disclosed |
| US-20250166989-A1 | THERMAL FILM DEPOSITION | LAM RES CORP (US) | 2025-05-22 | — | — | US | disclosed |
| US-20010029286-A1 | Procatalysts, catalyst systems, and use in OLEFIN polymerization | EASTMAN CHEMICAL COMPANY, A CORP. OF DELAWARE | 2001-10-11 | — | — | US | disclosed |
| US-20010025005-A1 | Procatalysts, catalyst systems, and use in olefin polymerization | EASTMAN CHEMICAL COMPANY, A CORPORATION OF DELAWARE | 2001-09-27 | — | — | US | disclosed |
| WO-2001051527-A1 | PROCATALYSTS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION | EASTMAN CHEMICAL COMPANY (US) | 2001-07-19 | — | — | WO | disclosed |
| WO-2001051526-A1 | PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION | EASTMAN CHEMICAL COMPANY (US) | 2001-07-19 | — | — | WO | disclosed |
| WO-2001051528-A1 | PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION | EASTMAN CHEMICAL COMPANY (US) | 2001-07-19 | — | — | WO | disclosed |
| WO-2001051529-A1 | PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION | EASTMAN CHEMICAL COMPANY (US) | 2001-07-19 | — | — | WO | disclosed |
| EP-0295401-A2 | Process for polymerizing polar compounds | WACKER-CHEMIE GMBH (DE) | 1988-12-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10242864-B2 | High temperature atomic layer deposition of silicon oxide thin films | SCN4A, RTN3, RPS4X | ALDH1A1 2635/4885HSD17B10 2377/4885SIGMAR1 394/4885 |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | NOS2, SFN, DSTYK | ALDH1A1 3404/4885HSD17B10 1979/4885SIGMAR1 237/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.