⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6754694 | 0.84 | LMNA (0.31) | — | |
| SCHEMBL7720084 | 0.80 | ALDH1A1 (0.36) | — | |
| SCHEMBL11647312 | 0.79 | LMNA (0.30) | — | |
| SCHEMBL6935640 | 0.77 | PER2 (0.33) | — | |
| SCHEMBL9972952 | 0.76 | KMT2A (0.36) | — | |
| SCHEMBL1196066 | 0.76 | — | — | |
| SCHEMBL2616354 | 0.76 | PIK3CD (0.33) | — | |
| SCHEMBL2159616 | 0.75 | LMNA (0.30) | — | |
| SCHEMBL27525130 | 0.75 | PER2 (0.33) | — | |
| SCHEMBL13292260 | 0.75 | BRD4 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7846646-B2 | Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method | TDK CORPORATION (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20070248916-A1 | Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method | TDK CORPORATION (JP) | 2007-10-25 | — | — | US | disclosed |
| US-6593063-B1 | Method of manufacturing a semiconductor device having an improved fine structure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-07-15 | — | — | US | disclosed |
| US-6579657-B1 | Material for forming a fine pattern and method for manufacturing a semiconductor device using the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-06-17 | — | — | US | disclosed |
| US-20020048631-A1 | Method of frame plating and method of forming magnetic pole of thin- film magnetic head | TDK CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-6319853-B1 | Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2001-11-20 | — | — | US | disclosed |