SCHEMBL6760179

SCHEMBL6760179

Cc1cc(-c2cc(C)c(CC3CO3)c(C)c2C)cc(C)c1CC1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL708659 0.83 ALDH1A1 (0.33)
SCHEMBL1856455 0.77 HRH3 (0.31)
SCHEMBL5583734 0.74 ALDH1A1 (0.32)
SCHEMBL30865852 0.72 ALDH1A1 (0.33)
SCHEMBL29013600 0.71
SCHEMBL4448832 0.71 PTGS1 (0.33)
SCHEMBL4448834 0.71 PTGS1 (0.33)
SCHEMBL4470143 0.70 ALDH1A1 (0.32)
SCHEMBL20851113 0.70 ALDH1A1 (0.42)
SCHEMBL23094088 0.68 CYP3A4 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6713589-B2 GLASS TRANSITION TEMPERATURE, LOW MOISTURE ABSORPTION, ADHESION HITACHI CHEMICAL COMPANY, LTD. (JP) 2004-03-30 US disclosed
US-20020065386-A1 Glass transition temperature, low moisture absorption, adhesion HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-05-30 US disclosed
US-6329492-B1 USEFUL AS MATERIAL FOR ENCAPSULATING ELECTRONIC DEVICES, FOR LAMINATION OR FOR ADHESION; CURING AGENT FOR EPOXY RESINS HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-12-11 US disclosed
US-5510446-A HEATING PRIMARY REACTION MIXTURE IN PRESENCE OF STRONG ACID; VACUUM CONCENTRATION OR STEAM DISTILLATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1996-04-23 US disclosed
US-5459223-A First stage polymerization, second stage curing, acid catalyst curing agent for an epoxy resin molding material for sealing electronic parts HITACHI CHEMICAL COMPANY (JP) 1995-10-17 US disclosed