SCHEMBL6764223

SCHEMBL6764223

COCCCCC1(C(=O)O)C2C=CC(C2)C1C1C2CC3CC(C2)CC1C3

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.32
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2477133 0.72 TDP1 (0.40) EPHX2
SCHEMBL4733433 0.66
SCHEMBL6468952 0.65 ALDH1A1 (0.37)
SCHEMBL6416963 0.59 EPHX2 (0.36) MAPK1EPHX2
SCHEMBL7699416 0.58 ALDH1A1 (0.36)
SCHEMBL9231492 0.57 HSD11B1 (0.33) MAPK1EPHX2
SCHEMBL6629750 0.56 CYP4F2 (0.49)
SCHEMBL13910042 0.56 EPHX2 (0.33) EPHX2
SCHEMBL5164436 0.55 HSD11B1 (0.34) MAPK1EPHX2
SCHEMBL13779854 0.55 EPHX2 (0.38) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6720129-B2 PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS HYNIX SEMICONDUCTOR INC (KR) 2004-04-13 US claimed
US-20020164541-A1 Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same HYNIX SEMICONDUCTOR, INC. (KR) 2002-11-07 US claimed
US-6720129-B2 PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS HYNIX SEMICONDUCTOR INC (KR) 2004-04-13 US disclosed
US-20020164541-A1 Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same HYNIX SEMICONDUCTOR, INC. (KR) 2002-11-07 US disclosed