Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | CTDSP1 | Q9GZU7 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6468952 | 0.90 | ALDH1A1 (0.37) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL17948249 | 0.81 | MEN1 (0.30) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL2476476 | 0.78 | ALDH1A1 (0.32) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL4733433 | 0.77 | — | — | |
| SCHEMBL10388139 | 0.74 | TDP1 (0.41) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL6764223 | 0.72 | MAPK1 (0.32) | EPHX2 | |
| SCHEMBL717502 | 0.72 | — | — | |
| SCHEMBL5076356 | 0.70 | TDP1 (0.56) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL1062711 | 0.70 | TDP1 (0.56) | TDP1ALDH1A1POLBCTDSP1MEN1 | |
| SCHEMBL17652072 | 0.70 | TDP1 (0.56) | TDP1ALDH1A1POLBCTDSP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130095425-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-18 | — | — | US | disclosed |
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | disclosed |
| US-6642336-B1 | Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-11-04 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |