SCHEMBL6468952

SCHEMBL6468952

CC1(C(=O)O)C2C=CC(C2)C1C1C2CC3CC(C2)CC1C3.FC1=C(F)C(F)(F)C1(F)F

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
MEN1 O00255 1/20 0.37
POLB P06746 1/20 0.37
KMT2A Q03164 1/20 0.37
CTDSP1 Q9GZU7 1/20 0.37
KDM4E B2RXH2 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2477133 0.90 TDP1 (0.40) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL17948249 0.73 MEN1 (0.30) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL2476476 0.70 ALDH1A1 (0.32) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL4733433 0.69
SCHEMBL10388139 0.66 TDP1 (0.41) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL6764223 0.65 MAPK1 (0.32)
SCHEMBL717502 0.65
SCHEMBL5076356 0.63 TDP1 (0.56) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL1062711 0.63 TDP1 (0.56) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL17652072 0.63 TDP1 (0.56) ALDH1A1TDP1MEN1POLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6849375-B2 Photoresist monomers, polymers thereof and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2005-02-01 US claimed
US-20030022101-A1 Photoresist monomers, polymers thereof and photoresist compositions containing the same INTELLECTUAL DISCOVERY CO. LTD. (KR) 2003-01-30 US claimed
US-6849375-B2 Photoresist monomers, polymers thereof and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2005-02-01 US disclosed
US-20030022101-A1 Photoresist monomers, polymers thereof and photoresist compositions containing the same INTELLECTUAL DISCOVERY CO. LTD. (KR) 2003-01-30 US disclosed