Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677931 | 0.90 | MEN1 (0.32) | HSD11B1EPHX2ALDH1A1MEN1KMT2A | |
| SCHEMBL15205287 | 0.87 | EPHX2 (0.31) | EPHX2ALDH1A1LMNA | |
| SCHEMBL5832827 | 0.87 | EPHX2 (0.31) | EPHX2ALDH1A1LMNA | |
| SCHEMBL1218496 | 0.82 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL5004543 | 0.79 | HSD11B1 (0.32) | HSD11B1ALDH1A1LMNAMEN1KMT2A | |
| SCHEMBL15206176 | 0.79 | MEN1 (0.32) | EPHX2ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL1217235 | 0.79 | ALDH1A1 (0.33) | EPHX2ALDH1A1 | |
| SCHEMBL677901 | 0.79 | GLA (0.32) | HSD11B1ALDH1A1 | |
| SCHEMBL1217916 | 0.77 | HSD11B1 (0.34) | HSD11B1EPHX2ALDH1A1 | |
| SCHEMBL44041 | 0.76 | ALDH1A1 (0.35) | HSD11B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20110275774-A1 | ORGANOANTIMONY COMPOUND, PROCESS FOR PREPARING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH USE OF SAME, AND THE POLYMER | YAMAGO SHIGERU | 2011-11-10 | — | — | US | disclosed |
| US-8008414-B2 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| EP-1829883-B1 | ORGANIC BISMUTH COMPOUND, METHOD FOR PRODUCING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING POLYMER USING SAME, AND POLYMER | OTSUKA CHEMICAL CO LTD (JP) | 2011-08-17 | — | — | EP | disclosed |
| EP-1767539-B1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL CO LTD (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-20060281022-A1 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-14 | — | — | US | disclosed |
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| EP-1681307-A1 | POLYMERIC COMPOUND CONTAINING REPEATING UNIT HAVING 2-OXATRICYCLO[4.2.1.04,8]NONAN-3-ONE RING, AND PHOTORESIST RESIN COMPOSITION | Daicel Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| EP-1676869-A1 | PHOTORESIST RESIN AND PHOTORESIST RESIN COMPOSITION | Daicel Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-7033726-B2 | Photoresist polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-20050238990-A1 | Photoresist resin and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1584634-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2005-10-12 | — | — | EP | disclosed |
| US-20050014087-A1 | Photoresist polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | HSD11B1 2935/4885EPHX2 1847/4885ALDH1A1 1006/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.