Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | SCN1A | P35498 | 1/20 | 0.31 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.31 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3182594 | 0.86 | GLA (0.33) | GLASCN1ASCN2ASCN3AALDH1A1 | |
| SCHEMBL3856231 | 0.84 | GLA (0.32) | GLASCN1ASCN2ASCN3AALDH1A1 | |
| SCHEMBL14358509 | 0.83 | SCN1A (0.34) | GLASCN1ASCN2ASCN3AALDH1A1 | |
| SCHEMBL1216334 | 0.81 | — | — | |
| SCHEMBL28766399 | 0.81 | LMNA (0.33) | ALDH1A1 | |
| SCHEMBL678397 | 0.79 | HSD11B1 (0.32) | ALDH1A1HSD11B1 | |
| SCHEMBL1219048 | 0.79 | ALDH1A1 (0.33) | SCN1ASCN2ASCN3AALDH1A1 | |
| SCHEMBL5004827 | 0.78 | SCN1A (0.31) | SCN1ASCN2ASCN3AHSD11B1 | |
| SCHEMBL5693012 | 0.78 | SCN1A (0.31) | SCN1ASCN2ASCN3AALDH1A1 | |
| SCHEMBL677988 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9862695-B2 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | DAICEL CORPORATION (JP) | 2018-01-09 | — | — | US | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20160060374-A1 | MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8753793-B2 | Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8530134-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8470510-B2 | Polymer for lithographic purposes and method for producing same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-6806335-B2 | FOR USE IN FINE PATTERNING OF SEMICONDUCTORS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-19 | — | — | US | disclosed |
| US-6692889-B1 | COPOLYMERS CONTAINING DERIVATIZED ADAMANTANYL ACRYLATE FUNCTIONALITY; ETCHING RESISTANCE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20040006189-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. | 2004-01-08 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6552143-B2 | Addition polymer including units of 1-oxo-perhydro-5,6-didehydro-4,7-methanoisobenzofuran; making a semiconductor using the photoresist; high adhesion, fine patterns | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-04-22 | — | — | US | disclosed |
| US-20020169266-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-14 | — | — | US | disclosed |
| US-6440636-B1 | HIGH ETCHING RESISTANCE, TRANSPARENCY, ALKALI SOLUBILITY, AND ADHESION; ACRYLIC ESTERS HAVING ADAMANTANE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-27 | — | — | US | disclosed |
| EP-1172384-A1 | POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1172694-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | GLA 4056/4885SCN1A 3998/4885SCN2A 4535/4885 |
| US-20160060374-A1 | MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND | CNKSR1, NMRAL1, CCNA1 | GLA 1789/4885SCN1A 1723/4885SCN2A 1800/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.