SCHEMBL6810153

SCHEMBL6810153

CCCC(=O)OC(C(O)CO)C(OC(C(O)CO)C(OC(=O)CCC)C(O)CO)C(O)CO

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.41
MAPK1 P28482 1/20 0.41
ALDH1A1 P00352 3/20 0.40
LMNA P02545 5/20 0.37
PRKCA P17252 5/20 0.36
PRKCE Q02156 2/20 0.36
PRKCQ Q04759 2/20 0.36
PRKCD Q05655 2/20 0.36
KDM4E B2RXH2 1/20 0.34
DUSP3 P51452 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
FAAH O00519 1/20 0.33
HPGD P15428 1/20 0.33
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
CES2 O00748 1/20 0.30
CES1 P23141 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16144901 0.83 MAPT (0.37) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL7985207 0.80 PRKCA (0.43) MAPTALDH1A1LMNAPRKCAPRKCE
SCHEMBL10539866 0.80 MAPT (0.66) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL4903929 0.78 PRKCA (0.44) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL5847228 0.77 ALDH1A1 (0.43) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL30932044 0.76 MAPT (0.66) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL4903674 0.76 PRKCA (0.36) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL6228481 0.75 MAPT (0.36) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL7155099 0.74 MAPT (0.41) MAPTMAPK1ALDH1A1LMNAPRKCA
SCHEMBL7527477 0.74 MAPT (0.41) MAPTMAPK1ALDH1A1LMNAPRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1489201-A2 Propanesulfonated or 2-hydroxy-propanesulfonated alkylamine alkoxylates, their preparation and use as additives for the electrolytic deposition of metallic layers Raschig GmbH (DE) 2004-12-22 EP disclosed