SCHEMBL682190

SCHEMBL682190

CCCCCOc1cccc(OCCOC(C)Oc2ccc(C(C)CC)cc2)c1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.44
PLA2G4B P0C869 2/20 0.42
ACACB O00763 1/20 0.42
ACACA Q13085 1/20 0.42
ALDH1A1 P00352 2/20 0.41
LTA4H P09960 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYSLTR2 Q9NS75 4/20 0.39
CYSLTR1 Q9Y271 4/20 0.39
GPBAR1 Q8TDU6 2/20 0.39
SLC7A5 Q01650 1/20 0.39
SMPD1 P17405 1/20 0.38
TLR4 O00206 1/20 0.38
TLR2 O60603 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682951 0.91 ALDH1A1 (0.48) TSHRALDH1A1LTA4HMEN1KMT2A
SCHEMBL14252111 0.90 ALDH1A1 (0.47) TSHRALDH1A1LTA4HMEN1KMT2A
SCHEMBL683584 0.90 PPARA (0.45) PLA2G4B
SCHEMBL2758470 0.89 NPSR1 (0.49) TSHRALDH1A1MEN1KMT2ATDP1
SCHEMBL683276 0.87 ACACB (0.43) TSHRACACBACACAALDH1A1LTA4H
SCHEMBL683286 0.86 SLC7A5 (0.43) TSHRALDH1A1LTA4HMEN1KMT2A
SCHEMBL111973 0.84 ALDH1A1 (0.49) TSHRALDH1A1LTA4HMEN1KMT2A
SCHEMBL2758499 0.84 SLC7A5 (0.41) TSHRACACBACACAALDH1A1LTA4H
SCHEMBL682946 0.83 ALDH1A1 (0.48) TSHRALDH1A1MEN1KMT2ATDP1
SCHEMBL12054775 0.83 SLC7A5 (0.46) TSHRALDH1A1MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed