SCHEMBL683276

SCHEMBL683276

CCC(C)c1ccc(OC(C)OCCOc2cccc(Oc3ccccc3)c2)cc1

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ACACB O00763 4/20 0.43
ACACA Q13085 4/20 0.43
HTR1D P28221 1/20 0.42
HTR1B P28222 1/20 0.42
KDM4E B2RXH2 6/20 0.41
LTA4H P09960 2/20 0.41
SLC7A5 Q01650 1/20 0.41
LMNA P02545 1/20 0.41
RAB9A P51151 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
ALDH1A1 P00352 4/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
TSHR P16473 1/20 0.39
GAA P10253 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683291 0.93 LTA4H (0.49) LTA4HSLC7A5LMNARAB9ATDP1
SCHEMBL111973 0.89 ALDH1A1 (0.49) LTA4HSLC7A5LMNARAB9ATDP1
SCHEMBL2758499 0.88 SLC7A5 (0.41) ACACBACACALTA4HSLC7A5TDP1
SCHEMBL2758470 0.88 NPSR1 (0.49) KDM4ERAB9ATDP1ALDH1A1SMN1; SMN2
SCHEMBL682190 0.87 TSHR (0.44) ACACBACACALTA4HSLC7A5TDP1
SCHEMBL682848 0.84 SLC7A5 (0.44) LTA4HSLC7A5RAB9ATDP1ALDH1A1
SCHEMBL2758478 0.84 TDP1 (0.48) KDM4ESLC7A5RAB9ATDP1ALDH1A1
SCHEMBL2758498 0.83 ALDH1A1 (0.46) SLC7A5LMNARAB9ATDP1ALDH1A1
SCHEMBL2758506 0.82 SLC7A5 (0.42) SLC7A5LMNARAB9ATDP1ALDH1A1
SCHEMBL10182929 0.81 TSHR (0.41) KDM4ELMNATDP1ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed