SCHEMBL682946

SCHEMBL682946

CCCCCc1ccc(OCCOC(C)Oc2ccc(C(C)CC)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
USP2 O75604 1/20 0.48
LMNA P02545 1/20 0.48
CYP3A4 P08684 1/20 0.48
MAPK1 P28482 1/20 0.48
CASP1 P29466 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
SLCO1B3 Q9NPD5 1/20 0.48
SLCO1B1 Q9Y6L6 1/20 0.48
TDP1 Q9NUW8 1/20 0.43
TSHR P16473 1/20 0.40
SLC2A1 P11166 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682951 0.91 ALDH1A1 (0.48) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL14252111 0.90 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ALMNATDP1
SCHEMBL683584 0.88 PPARA (0.45)
SCHEMBL14196429 0.84 SLC7A5 (0.39) ALDH1A1MEN1KMT2ACYP3A4MAPK1
SCHEMBL682190 0.83 TSHR (0.44) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL12054775 0.83 SLC7A5 (0.46) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL14196431 0.82 TDP1 (0.39) ALDH1A1MEN1KMT2ALMNACYP3A4
SCHEMBL14196427 0.82 SLC7A5 (0.40) ALDH1A1MEN1KMT2ACYP3A4MAPK1
SCHEMBL111973 0.82 ALDH1A1 (0.49) ALDH1A1MEN1KMT2ALMNASMN1; SMN2
SCHEMBL682235 0.82 ALDH1A1 (0.48) ALDH1A1MEN1KMT2ALMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20130236837-A1 METHOD FOR FORMING A RESIST PATTERN AND A METHOD FOR PROCESSING A SUBSTRATE UTILIZING THE METHOD FOR FORMING A RESIST PATTERN FUJIFILM CORPORATION (JP) 2013-09-12 US disclosed
US-20130236837-A1 METHOD FOR FORMING A RESIST PATTERN AND A METHOD FOR PROCESSING A SUBSTRATE UTILIZING THE METHOD FOR FORMING A RESIST PATTERN FUJIFILM CORPORATION (JP) 2013-09-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed