Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 5/20 | 0.45 |
| ▸ | PPARG | P37231 | 3/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 9/20 | 0.43 |
| ▸ | CNR1 | P21554 | 1/20 | 0.41 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.39 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.38 |
| ▸ | GGPS1 | O95749 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL682190 | 0.90 | TSHR (0.44) | PLA2G4B | |
| SCHEMBL682946 | 0.88 | ALDH1A1 (0.48) | — | |
| SCHEMBL682951 | 0.84 | ALDH1A1 (0.48) | — | |
| SCHEMBL14252111 | 0.82 | ALDH1A1 (0.47) | — | |
| SCHEMBL2758470 | 0.82 | NPSR1 (0.49) | — | |
| SCHEMBL14258798 | 0.81 | SLC7A5 (0.40) | — | |
| SCHEMBL111973 | 0.80 | ALDH1A1 (0.49) | — | |
| SCHEMBL683276 | 0.80 | ACACB (0.43) | — | |
| SCHEMBL2758499 | 0.80 | SLC7A5 (0.41) | — | |
| SCHEMBL683286 | 0.79 | SLC7A5 (0.43) | CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |