⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685691 | 0.83 | TSHR (0.30) | — | |
| SCHEMBL6831557 | 0.83 | HSD11B1 (0.31) | — | |
| SCHEMBL14519258 | 0.82 | HSD11B1 (0.33) | — | |
| SCHEMBL525197 | 0.81 | TSHR (0.34) | — | |
| SCHEMBL14519260 | 0.78 | — | — | |
| SCHEMBL14519253 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL12194035 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL6829344 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL12194036 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL14519236 | 0.71 | HSD11B1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |