Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13521897 | 0.85 | TSHR (0.30) | TSHR | |
| SCHEMBL4403803 | 0.84 | TSHR (0.34) | TSHR | |
| SCHEMBL686051 | 0.84 | TSHR (0.38) | TSHR | |
| SCHEMBL6831557 | 0.83 | HSD11B1 (0.31) | TSHR | |
| SCHEMBL685691 | 0.83 | TSHR (0.30) | TSHR | |
| SCHEMBL6330636 | 0.83 | TSHR (0.30) | TSHR | |
| SCHEMBL5346885 | 0.83 | HSD11B1 (0.33) | TSHR | |
| SCHEMBL4406080 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL4399179 | 0.82 | TSHR (0.33) | TSHR | |
| SCHEMBL14519258 | 0.82 | HSD11B1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 780 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117659263-A | Weather-resistant room-temperature-degradable water-soluble photosensitive resin, application and preparation method thereof | 中国地质大学（武汉） | 2024-03-08 | — | — | CN | claimed |
| CN-115536776-B | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-114380937-B | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技股份有限公司 | 2023-04-07 | — | — | CN | claimed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-114380937-A | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108132584-B | Photoresist composition containing poly (p-hydroxystyrene) polymer and acrylate copolymer | 江苏汉拓光学材料有限公司 | 2020-12-08 | — | — | CN | claimed |
| CN-104230712-A | Method for preparing 2-isopropyl-2-adamantyl acrylate | SHANGHAI B & C CHEMICAL CO LTD | 2014-12-24 | — | — | CN | claimed |
| US-8916330-B2 | Chemically amplified photoresist composition and method for forming resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-23 | — | — | US | claimed |
| US-8883394-B2 | — | — | 2014-11-11 | — | — | US | claimed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | claimed |
| CN-101930178-A | The manufacture method of chemical amplifying type photo-corrosion-resisting agent composition and corrosion-resisting pattern | SUMITOMO CHEMICAL CO | 2010-12-29 | — | — | CN | claimed |
| US-7579132-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | claimed |
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-02-21 | — | — | US | claimed |
| EP-4560309-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | National Institute for Materials Science (JP) | 2025-05-28 | — | — | EP | disclosed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | disclosed |
| WO-2025033010-A1 | COMPOSITION ESTIMATION METHOD, COMPOSITION ESTIMATION DEVICE, PROGRAM, SAMPLE CONTAINER, AND THERMOGRAVIMETRY/MASS SPECTROMETRY METHOD | 国立研究開発法人物質・材料研究機構 | 2025-02-13 | — | — | WO | disclosed |
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |
| JP-2000136165-A | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | DAICEL CHEM IND LTD | 2000-05-16 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | NHERF1, SLC26A3, HCN3 | TSHR 1310/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.