Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12194036 | 1.00 | ALDH1A1 (0.36) | ALDH1A1MAPTHSD17B10CA2HSD11B1 | |
| SCHEMBL12194035 | 1.00 | ALDH1A1 (0.36) | ALDH1A1MAPTHSD17B10CA2HSD11B1 | |
| SCHEMBL15827321 | 0.79 | ALDH1A1 (0.36) | ALDH1A1HSD11B1 | |
| SCHEMBL12219710 | 0.79 | ALDH1A1 (0.36) | ALDH1A1HSD11B1 | |
| SCHEMBL8366021 | 0.75 | HSD11B1 (0.35) | MAPTHSD11B1 | |
| SCHEMBL19557166 | 0.73 | HSD11B1 (0.48) | ALDH1A1HSD11B1 | |
| SCHEMBL12714 | 0.73 | HSD11B1 (0.48) | ALDH1A1HSD11B1 | |
| SCHEMBL19557168 | 0.73 | HSD11B1 (0.48) | ALDH1A1HSD11B1 | |
| SCHEMBL28006997 | 0.73 | L3MBTL1 (0.35) | ALDH1A1HSD11B1 | |
| Acetic Acid SCHEMBL2777409 | 0.72 | ALDH1A1 (0.49) | ALDH1A1MAPTCA2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |