SCHEMBL682848

SCHEMBL682848

CCC(C)c1ccc(OC(C)OCCOc2ccccc2Oc2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.44
CASP1 P29466 1/20 0.42
ALDH1A1 P00352 3/20 0.40
TSHR P16473 1/20 0.40
NPSR1 Q6W5P4 1/20 0.37
LTA4H P09960 3/20 0.36
TDP1 Q9NUW8 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
KCNH2 Q12809 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
LTB4R Q15722 1/20 0.34
LTB4R2 Q9NPC1 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683291 0.89 LTA4H (0.49) SLC7A5ALDH1A1TSHRLTA4HTDP1
SCHEMBL111973 0.87 ALDH1A1 (0.49) SLC7A5ALDH1A1TSHRLTA4HTDP1
SCHEMBL683286 0.86 SLC7A5 (0.43) SLC7A5ALDH1A1TSHRNPSR1LTA4H
SCHEMBL2758502 0.84 KDM4E (0.45) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL683276 0.84 ACACB (0.43) SLC7A5ALDH1A1TSHRNPSR1LTA4H
SCHEMBL12974513 0.82 SLC7A5 (0.42) SLC7A5CASP1ALDH1A1TSHRLTA4H
SCHEMBL2758474 0.82 HTR1B (0.46) KMT2A
SCHEMBL14258895 0.81 ALDH1A1 (0.47) SLC7A5ALDH1A1TSHRTDP1L3MBTL1
SCHEMBL2758498 0.81 ALDH1A1 (0.46) SLC7A5ALDH1A1TSHRTDP1CYP1A2
SCHEMBL14252125 0.81 ALDH1A1 (0.46) SLC7A5ALDH1A1TSHRLTA4HTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed