SCHEMBL6830198

SCHEMBL6830198

N#CCOC(=O)CCCCBr

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSTP1 P09211 1/20 0.38
DGKA P23743 1/20 0.36
PAM P19021 2/20 0.33
CYP1A2 P05177 1/20 0.32
TSHR P16473 3/20 0.32
MAPT P10636 1/20 0.32
ZDHHC20 Q5W0Z9 1/20 0.31
ZDHHC2 Q9UIJ5 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
LMNA P02545 2/20 0.31
DNM1 Q05193 1/20 0.31
ALDH1A1 P00352 1/20 0.31
CYP3A4 P08684 1/20 0.31
ATM Q13315 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
EPHX2 P34913 1/20 0.30
KDM4E B2RXH2 1/20 0.30
DUSP3 P51452 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14063623 0.89 DGKA (0.45) GSTP1DGKAPAMCYP1A2TSHR
SCHEMBL10011617 0.83 GSTP1 (0.38) GSTP1DGKAPAMCYP1A2TSHR
SCHEMBL13751320 0.83 GPR84 (0.38) GSTP1DGKAPAMCYP1A2TSHR
SCHEMBL9360783 0.82 ADRA2A (0.37) GSTP1DGKACYP1A2TSHRMAPT
SCHEMBL10011198 0.82 GSTP1 (0.56) GSTP1DGKAPAMCYP1A2TSHR
SCHEMBL30861849 0.80 DGKA (0.62) DGKAPAMTSHRMAPTZDHHC20
SCHEMBL10009361 0.79 GSTP1 (0.34) GSTP1DGKACYP1A2TSHRZDHHC20
SCHEMBL4646333 0.79 DGKA (0.50) DGKAPAMCYP1A2TSHRMAPT
SCHEMBL27601993 0.79 MCL1 (0.39) GSTP1DGKACYP1A2TSHRZDHHC20
SCHEMBL10011558 0.79 MAPT (0.47) GSTP1DGKAPAMCYP1A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743564-B2 A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-01 US disclosed
US-20020115018-A1 Amine compounds, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed