SCHEMBL683265

SCHEMBL683265

CCC(C)c1ccc(OC(C)OCCOc2c(C(C)(C)C)cccc2C(C)(C)C)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.37
TSHR P16473 1/20 0.37
SLC7A5 Q01650 1/20 0.37
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
SMN1; SMN2 Q16637 4/20 0.33
KDM4E B2RXH2 1/20 0.33
ORAI1 Q96D31 1/20 0.33
MAPT P10636 2/20 0.32
GAA P10253 1/20 0.32
NPC1 O15118 3/20 0.32
RAB9A P51151 3/20 0.32
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
HSP90AA1 P07900 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
NFKB1 P19838 1/20 0.30
NFKB2 Q00653 1/20 0.30
RELA Q04206 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14252197 0.88 ALDH1A1 (0.36) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL13920795 0.84 ALDH1A1 (0.40) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL683261 0.83 ALDH1A1 (0.40) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL683275 0.82 ALDH1A1 (0.39) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL12974415 0.82 SLC7A5 (0.39) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL14258895 0.81 ALDH1A1 (0.47) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL10148362 0.81 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL682221 0.80 SLC7A5 (0.41) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL111973 0.79 ALDH1A1 (0.49) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL682188 0.79 KCNH2 (0.36) ALDH1A1TSHRSLC7A5MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-7344821-B2 Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same FUJIFILM CORPORATION (JP) 2008-03-18 US disclosed
US-7326513-B2 Positive working resist composition FUJIFILM CORPORATION (JP) 2008-02-05 US disclosed
US-7250246-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed