SCHEMBL683261

SCHEMBL683261

CCC(C)c1ccc(OC(C)OCCOc2ccc(C(C)(C)C)c(C(C)(C)C)c2)cc1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
TSHR P16473 1/20 0.37
SLC7A5 Q01650 1/20 0.34
KCNH2 Q12809 1/20 0.34
ORAI1 Q96D31 1/20 0.33
LMNA P02545 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
MAOB P27338 2/20 0.31
HSP90AA1 P07900 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10148362 0.84 ALDH1A1 (0.45) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL683265 0.83 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL682188 0.81 KCNH2 (0.36) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL14258895 0.81 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL13879094 0.81 ALDH1A1 (0.45) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL2758478 0.80 TDP1 (0.48) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL683310 0.80 ABCB11 (0.46) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL682846 0.80 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL10148540 0.80 ALDH1A1 (0.43) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL111973 0.79 ALDH1A1 (0.49) ALDH1A1MEN1KMT2ATDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed