SCHEMBL683275

SCHEMBL683275

CCC(C)c1ccc(OC(C)OCCOc2c(C(C)C)cccc2C(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
TSHR P16473 2/20 0.39
SLC7A5 Q01650 1/20 0.38
ALOX15 P16050 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ORAI1 Q96D31 1/20 0.36
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 1/20 0.32
TP53 P04637 1/20 0.32
HSP90AA1 P07900 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
KCNH2 Q12809 1/20 0.31
SCN5A Q14524 1/20 0.31
SCN9A Q15858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14252161 0.89 ALDH1A1 (0.38) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL13920795 0.86 ALDH1A1 (0.40) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL14258895 0.83 ALDH1A1 (0.47) ALDH1A1TSHRSLC7A5ALOX15MEN1
SCHEMBL683265 0.82 ALDH1A1 (0.37) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL682846 0.82 ALDH1A1 (0.41) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL682221 0.81 SLC7A5 (0.41) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL111973 0.81 ALDH1A1 (0.49) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL682847 0.80 KCNH2 (0.39) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL12054776 0.80 NPC1 (0.37) TSHRALOX15MAPTNPC1RAB9A
SCHEMBL2758504 0.80 SLC7A5 (0.39) ALDH1A1TSHRSLC7A5MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-7615330-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-11-10 US disclosed
US-7504193-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2009-03-17 US disclosed
US-7374860-B2 Positive resist composition and pattern forming method using the same FUJI FILM CORPORATION (JP) 2008-05-20 US disclosed
US-20070224540-A1 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-09-27 US disclosed
US-7250246-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed