SCHEMBL682846

SCHEMBL682846

CCC(C)c1ccc(OC(C)OCCOc2ccc(C(C)C)c(C(C)C)c2)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
TSHR P16473 1/20 0.39
KDM4E B2RXH2 3/20 0.37
CARM1 Q86X55 1/20 0.37
HTT P42858 1/20 0.37
SLC7A5 Q01650 1/20 0.36
KCNH2 Q12809 1/20 0.35
LMNA P02545 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ORAI1 Q96D31 1/20 0.34
GAA P10253 2/20 0.34
MAOB P27338 1/20 0.33
MAPT P10636 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2758478 0.85 TDP1 (0.48) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL14252161 0.84 ALDH1A1 (0.38) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL14258895 0.83 ALDH1A1 (0.47) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL2758476 0.82 ABCB11 (0.44) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL682847 0.82 KCNH2 (0.39) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL683275 0.82 ALDH1A1 (0.39) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL683310 0.82 ABCB11 (0.46) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL10148540 0.82 ALDH1A1 (0.43) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL111973 0.81 ALDH1A1 (0.49) ALDH1A1KMT2AMEN1TDP1TSHR
SCHEMBL682235 0.81 ALDH1A1 (0.48) ALDH1A1KMT2AMEN1TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed