SCHEMBL683303

SCHEMBL683303

CCC(C)c1ccc(OC(C)OCC2CCCC2)cc1

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.42
FFAR1 O14842 1/20 0.41
TSHR P16473 1/20 0.39
KMT2A Q03164 3/20 0.39
SLC7A5 Q01650 1/20 0.39
NPSR1 Q6W5P4 1/20 0.37
GAA P10253 1/20 0.36
MAPT P10636 1/20 0.36
GPR88 Q9GZN0 1/20 0.35
MEN1 O00255 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
MITF O75030 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682855 0.99 FFAR1 (0.43) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL13581436 0.94 ALDH1A1 (0.41) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL14196456 0.89 ALDH1A1 (0.38) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL6367528 0.86 FFAR1 (0.42) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL683300 0.86 ALDH1A1 (0.43) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL14196461 0.85 FFAR1 (0.41) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL111625 0.85 ALDH1A1 (0.42) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL14049134 0.85 ALDH1A1 (0.42) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL17175323 0.84 FFAR1 (0.40) ALDH1A1FFAR1TSHRKMT2ASLC7A5
SCHEMBL682208 0.84 ALDH1A1 (0.41) ALDH1A1FFAR1TSHRKMT2ASLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed