SCHEMBL682208

SCHEMBL682208

CCC(C)c1ccc(OC(C)OCCCC2CCCC2)cc1

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
SLC7A5 Q01650 1/20 0.38
HRH3 Q9Y5N1 1/20 0.37
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
TSHR P16473 1/20 0.36
NFE2L2 Q16236 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
KDM4E B2RXH2 1/20 0.33
HPGD P15428 1/20 0.33
KLK7 P49862 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
FFAR1 O14842 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683622 0.99 ALDH1A1 (0.40) ALDH1A1SLC7A5HRH3KMT2AMEN1
SCHEMBL683300 0.92 ALDH1A1 (0.43) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL111625 0.91 ALDH1A1 (0.42) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL14049134 0.91 ALDH1A1 (0.42) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL683303 0.84 ALDH1A1 (0.42) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL6367423 0.83 SLC7A5 (0.47) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL14258788 0.83 SLC7A5 (0.47) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL682855 0.83 FFAR1 (0.43) ALDH1A1SLC7A5KMT2AMEN1TSHR
SCHEMBL14196448 0.82 ALDH1A1 (0.39) ALDH1A1SLC7A5KMT2AMEN1TDP1
SCHEMBL12054775 0.82 SLC7A5 (0.46) ALDH1A1SLC7A5KMT2AMEN1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed