SCHEMBL683300

SCHEMBL683300

CCC(C)c1ccc(OC(C)OCCC2CCCC2)cc1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
NFE2L2 Q16236 1/20 0.38
TSHR P16473 1/20 0.38
KMT2A Q03164 2/20 0.37
SLC7A5 Q01650 1/20 0.37
NPSR1 Q6W5P4 1/20 0.35
MEN1 O00255 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
KDM4E B2RXH2 1/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
FFAR1 O14842 1/20 0.34
KLK7 P49862 1/20 0.34
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL111625 0.99 ALDH1A1 (0.42) ALDH1A1NFE2L2TSHRKMT2ASLC7A5
SCHEMBL14049134 0.99 ALDH1A1 (0.42) ALDH1A1NFE2L2TSHRKMT2ASLC7A5
SCHEMBL682208 0.92 ALDH1A1 (0.41) ALDH1A1NFE2L2TSHRKMT2ASLC7A5
SCHEMBL683622 0.91 ALDH1A1 (0.40) ALDH1A1NFE2L2TSHRKMT2ASLC7A5
SCHEMBL14196448 0.90 ALDH1A1 (0.39) ALDH1A1TSHRKMT2ASLC7A5NPSR1
SCHEMBL11922905 0.88 ABCB11 (0.39) ALDH1A1NFE2L2TSHRKMT2AFFAR1
SCHEMBL10182645 0.87 ALDH1A1 (0.41) ALDH1A1NFE2L2TSHRKMT2ASLC7A5
SCHEMBL25504988 0.87 NFE2L2 (0.40) ALDH1A1NFE2L2KMT2AMEN1KDM4E
SCHEMBL2631350 0.86 NFE2L2 (0.47) ALDH1A1NFE2L2KMT2ANPSR1MEN1
SCHEMBL683303 0.86 ALDH1A1 (0.42) ALDH1A1TSHRKMT2ASLC7A5NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed