Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ACACB | O00763 | 4/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | APP | P05067 | 1/20 | 0.36 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL111764 | 0.86 | ALDH1A1 (0.46) | ALDH1A1KDM4EKMT2AMEN1TDP1 | |
| SCHEMBL14287838 | 0.86 | ALDH1A1 (0.42) | ALDH1A1KDM4ETSHRACACBALOX12 | |
| SCHEMBL2607811 | 0.85 | ALDH1A1 (0.41) | ALDH1A1KDM4EKMT2AMEN1TDP1 | |
| SCHEMBL683620 | 0.85 | ALDH1A1 (0.47) | ALDH1A1KDM4EKMT2AMEN1TDP1 | |
| SCHEMBL14573487 | 0.83 | ALDH1A1 (0.48) | ALDH1A1KMT2ATSHRACACBFFAR1 | |
| SCHEMBL17931689 | 0.81 | HRH3 (0.45) | ALDH1A1KDM4EKMT2AMEN1TDP1 | |
| SCHEMBL683155 | 0.80 | KDM4E (0.42) | ALDH1A1KDM4EACACBFFAR1HRH3 | |
| SCHEMBL111973 | 0.80 | ALDH1A1 (0.49) | ALDH1A1KMT2AMEN1TDP1TSHR | |
| SCHEMBL682235 | 0.80 | ALDH1A1 (0.48) | ALDH1A1KMT2AMEN1TDP1TSHR | |
| SCHEMBL683579 | 0.79 | PPARG (0.40) | ALDH1A1KMT2AMEN1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| US-7344821-B2 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-03-18 | — | — | US | disclosed |
| US-7326513-B2 | Positive working resist composition | FUJIFILM CORPORATION (JP) | 2008-02-05 | — | — | US | disclosed |