Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.82 |
| ▸ | TP53 | P04637 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.46 |
| ▸ | HSPA5 | P11021 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8078719 | 0.98 | AMY1A (0.86) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL1345514 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL1345917 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL218957 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL1345563 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL18352 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL3820165 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL29623092 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| SCHEMBL30320292 | 0.90 | AMY1A (1.00) | AMY1ATP53TDP1HIF1ACYP2C9 | |
| Phosphine SCHEMBL26919025 | 0.89 | AMY1A (0.96) | AMY1ATP53TDP1HIF1ACYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020209118-A1 | REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME | 株式会社パイロットコーポレーション | 2020-10-15 | — | — | WO | disclosed |
| WO-2020203603-A1 | REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME | パイロットインキ株式会社 | 2020-10-08 | — | — | WO | disclosed |
| WO-2020194683-A1 | THERMOPLASTIC RESIN COMPOSITION | 日本エイアンドエル株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-20200292939-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-09-17 | — | — | US | disclosed |
| US-20170183477-A1 | STABILIZED MOISTURE-CURABLE POLYMERIC COMPOSITIONS | DOW GLOBAL TECHNOLOGIES LLC | 2017-06-29 | — | — | US | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| EP-2727962-A1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING SAME | Toray Industries, Inc. (JP) | 2014-05-07 | — | — | EP | disclosed |
| CN-100470365-C | Positive imaging material | FUJI PHOTO FILM CO LTD (JP) | 2009-03-18 | — | — | CN | disclosed |
| US-6716565-B2 | APPLICABLE TO IMAGE-FORMING MATERIALS SUCH AS THREE-DIMENSIONAL MODELLING BY LIGHT, HOLOGRAPHY, LITHOGRAPHIC PRINTING PLATES, COLOR PROOFS, PHOTORESISTS AND COLOR FILTERS, AND INKS, PAINTS AND ADHESIVES | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20030057610-A1 | Applicable to image-forming materials such as three-dimensional modelling by light, holography, lithographic printing plates, color proofs, photoresists and color filters, and inks, paints and adhesives | FUJIFILM CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| CN-1365025-A | Positive imaging material | FUJI PHOTO FILM CO LTD (JP) | 2002-08-21 | — | — | CN | disclosed |
| US-6177226-B1 | PROVIDES A CONTACT HOLE PATTERN IMAGE HAVING LESS DIMPLES AND BEING IN EXACT ACCORDANCE WITH A MASK PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-01-23 | — | — | US | disclosed |
| EP-0686274-B1 | NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS | CLARIANT FINANCE BVI LTD (VG) | 1998-12-23 | — | — | EP | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| US-5510420-A | NUCLEOPHILIC GRAFTING OF PARENT POLYMER HAVING AROMATIC RINGS CONTAINING REACTIVE GROUPS | HOECHST CELANESE CORPORATION (US) | 1996-04-23 | — | — | US | disclosed |
| EP-0686274-A1 | NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS | HOECHST CELANESE CORPORATION (US) | 1995-12-13 | — | — | EP | disclosed |
| WO-1994019724-A1 | NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS | HOECHST CELANESE CORPORATION (US) | 1994-09-01 | — | — | WO | disclosed |