Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.46 |
| ▸ | NPC1 | O15118 | 3/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | APAF1 | O14727 | 1/20 | 0.42 |
| ▸ | MITF | O75030 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | CES1 | P23141 | 2/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 2/20 | 0.38 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3491015 | 0.83 | SRC (0.50) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL28349405 | 0.80 | MEP1B (0.38) | RECQLKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL3690329 | 0.80 | RAB9A (0.54) | RECQLKMT2ANPC1RAB9AMEN1 | |
| SCHEMBL9279658 | 0.78 | KDM4E (0.43) | RECQLKMT2ANPC1RAB9AMEN1 | |
| SCHEMBL909723 | 0.77 | MEN1 (0.46) | KMT2AMEN1ALDH1A1KDM4ETDP1 | |
| SCHEMBL28638353 | 0.76 | RAB9A (0.54) | RECQLKMT2ANPC1RAB9AMEN1 | |
| SCHEMBL1607324 | 0.76 | CES1 (0.35) | RECQLKMT2ANPC1RAB9AMEN1 | |
| SCHEMBL5189165 | 0.76 | TDP1 (0.45) | KMT2ANPC1RAB9AMEN1ALDH1A1 | |
| SCHEMBL1607815 | 0.76 | RAPGEF4 (0.44) | RECQLKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL1180196 | 0.76 | GAA (0.41) | RECQLKMT2AMEN1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| US-5238781-A | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYPHENOLS AND ACETALS | CIBA-GEIGY CORPORATION (US) | 1993-08-24 | — | — | US | claimed |
| EP-0501919-A1 | Radiation-sensitive compositions based on polyphenols and acetals | CIBA-GEIGY AG (CH) | 1992-09-02 | — | — | EP | claimed |
| CN-108701582-B | Photosensitive stacked structure | 富士胶片电子材料美国有限公司 | 2023-05-02 | — | — | CN | disclosed |
| EP-0742255-B1 | Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors | CIBA SC HOLDING AG (CH) | 2004-04-14 | — | — | EP | disclosed |
| CN-1084758-C | Colouration of high molecular weight organic materials in mass with soluble phthalocyanine precursors | CIBA GEIGY AG (CH) | 2002-05-15 | — | — | CN | disclosed |
| US-6180315-B1 | FORMING POLYMER LAYER CONTAINING PATTERN OR IMAGE OF DISSOLVED PIGMENT PRECURSOR COMPONENT, POLYMER OR NATURAL OR SYNTHETIC RESIN, CATALYST FOR PIGMENT FORMATION; LOCALLY REGENERATING PIGMENT BY CHEMICAL, PHOTOLYTICAL, THERMAL OR LASER MEANS | CIBA SPECIALTY CHEMCIALS CORPORATION | 2001-01-30 | — | — | US | disclosed |
| US-6040108-A | FORMING RESIN LAYER CONTAINING DISSOLVED ORGANIC PIGMENT PRECURSOR, IMAGEWISE PRECIPITATING COLORED NANO-SIZED PIGMENT PARTICLES UPON EXPOSURE TO CHEMICAL, THERMAL, PHOTOLYTIC OR LASER IRRADIATION MEANS | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2000-03-21 | — | — | US | disclosed |
| EP-0654711-B1 | Compositions for making structured color images and application thereof | CIBA GEIGY AG (CH) | 1999-06-02 | — | — | EP | disclosed |
| US-5879855-A | PIGMENT PRECURSOR DISSOLVED IN COMPOSITION WHICH CAN BE TRANSFORMED TO INSOLUBLE PIGMENT, POSITIVE OR NEGATIVE PHOTORESIST WHICH CAN BE MODIFIED | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 1999-03-09 | — | — | US | disclosed |
| US-5830267-A | Coloration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 1998-11-03 | — | — | US | disclosed |
| EP-0601974-B1 | Positive photoresist with better properties | OCG MICROELECTRONIC MATERIALS (US) | 1997-05-28 | — | — | EP | disclosed |
| CN-1144818-A | Colouration of high molecular weight organic materials in mass with soluble phthalocyanine precursors | CIBA GEIGY AG (CH) | 1997-03-12 | — | — | CN | disclosed |
| EP-0742255-A1 | Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors | CIBA-GEIGY AG (CH) | 1996-11-13 | — | — | EP | disclosed |
| EP-0654711-A1 | Compositions for making structured color images and application thereof | CIBA-GEIGY AG (CH) | 1995-05-24 | — | — | EP | disclosed |
| EP-0624827-A1 | Method of making micropatterns | CIBA-GEIGY AG (CH) | 1994-11-17 | — | — | EP | disclosed |
| EP-0601974-A1 | Positive photoresist with better properties | OCG Microelectronic Materials Inc. (US) | 1994-06-15 | — | — | EP | disclosed |
| EP-0502819-A1 | Acid hardenable copolymers | CIBA-GEIGY AG (CH) | 1992-09-09 | — | — | EP | disclosed |
| EP-0501919-A1 | Radiation-sensitive compositions based on polyphenols and acetals | CIBA-GEIGY AG (CH) | 1992-09-02 | — | — | EP | disclosed |